Inventor
Min Ho Jung
Inventor
Kyungki-do, KR
Overview
Patents· 92 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds18%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
C07CAcyclic or carbocyclic compounds11%
C07DHeterocyclic compounds4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds3%
A47LDomestic washing or cleaning3%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
Y02PClimate change mitigation technologies in the production or processing of goods2%
PatentTitleYear
10,758,248Direction adjustable surgical tissue removal device202010,604,615Rigid polyurethane foam and preparation method thereof202010,602,908Dish washing machine202010,563,340Door and clothes treating apparatus having the same202010,362,924Jet unit, jet nozzle and manufacturing method thereof, and dish washing machine having the same201910,227,450Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for manufacturing semiconductor device using the composition201910,188,261Dish washing machine201910,149,594Dishwasher and method for controlling same201810,143,353Dishwasher and method for controlling same201810,100,073Method for preparing low-molecular lignin derivative201810,034,595Dishwasher and controlling method thereof20189,996,007Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for manufacturing semiconductor device using the composition20189,861,254'Dish washing machine'20189,695,279'Polymer for preparing resist underlayer film, resist underlayer film composition containing the polymer and method for forming resist underlayer film using the composition'20179,657,428'Drain pump and washing machine having the same'20179,589,788'Polymer with a good heat resistance and storage stability, underlayer film composition containing the polymer and process for forming underlayer film using the composition'20179,441,395'Door and clothes treating apparatus having the same'20168,633,660'Control device, LED light emitting device including the same, and control method'20148,125,197'Switch controller, switch control method, and converter using the same'20127,746,621'Bar type ionizer'20107,710,707'Flexible soft X-ray ionizer'20107,329,477'Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same'20087,208,260'Cross-linking monomers for photoresist, and process for preparing photoresist polymers using the same'20077,150,961'Additive for photoresist composition for resist flow process'20066,998,442'Organic anti-reflective coating polymers, anti-reflective coating composition comprising the same and preparation methods thereof'20066,984,482'Top-coating composition for photoresist and process for forming fine pattern using the same'20066,956,091'Organic anti-reflective polymer and preparation thereof'20056,858,371'Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same'20056,824,951'Photoresist composition for resist flow process'20046,811,960'Partially crosslinked polymer for bilayer photoresist'20046,803,172'Organic anti-reflective coating material and preparation thereof'20046,797,451'Reflection-inhibiting resin used in process for forming photoresist pattern'20046,780,953'Organic polymer for anti-reflective coating layer and preparation thereof'20046,770,414'Additive for photoresist composition for resist flow process'20046,770,720'Organic polymer for organic anti-reflective coating layer and preparation thereof'20046,770,415'Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same'20046,699,644'Process for forming a photoresist pattern comprising alkaline treatment'20046,692,891'Photoresist composition containing photo radical generator with photoacid generator'20046,686,123'Photoresist monomer, polymer thereof and photoresist composition containing the same'20046,632,903'Polymer-containing photoresist, and process for manufacturing the same'20036,627,383'Photoresist monomer comprising bisphenol derivatives and polymers thereof'20036,610,616'Method for forming micro-pattern of semiconductor device'20036,608,158'Copolymer resin, preparation thereof, and photoresist using the same'20036,602,650'Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and methods of preparation thereof'20036,599,678'Organic anti-reflective coating polymer, anti-reflective coating composition comprising the same and method of preparation thereof'20036,593,446'Organic polymer for organic anti-reflective coating layer and preparation thereof'20036,589,707'Partially crosslinked polymer for bilayer photoresist'20036,586,619'Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same'20036,582,883'Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof'20036,569,599'Partially crosslinked polymer for bilayer photoresist'20036,562,925'Organic anti-reflective coating polymer, anti-reflective coating composition and methods of preparation thereof'20036,548,613'Organic anti-reflective coating polymer and preparation thereof'20036,538,090'Organic anti-reflective polymer and method for manufacturing thereof'20036,531,562'Photoresist monomer, polymer thereof and photoresist composition containing it'20036,492,441'Anti reflective coating polymers and the preparation method thereof'20026,489,432'Organic anti-reflective coating polymer and preparation thereof'20026,489,423'Organic anti-reflective polymer and method for manufacturing thereof'20026,486,283'Organic anti-reflective coating polymer, anti-reflective coating composition methods of preparation thereof'20026,465,147'Cross-linker for photoresist, and process for forming a photoresist pattern using the same'20026,448,352'Photoresist monomer, polymer thereof and photoresist composition containing it'20026,426,171'Photoresist monomer, polymer thereof and photoresist composition containing it'20026,423,797'Anti-reflective coating polymers from p-tosylmethylacrylamide and preparation method'20026,416,926'Thiabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same'20026,410,670'Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same'20026,399,272'Phenylenediamine derivative-type additive useful for a chemically amplified photoresist'20026,395,397'Organic anti-reflective coating polymer and preparation thereof'20026,391,518'Polymers and photoresist compositions using the same'20026,388,039'Organic anti-reflective polymer and method for manufacturing thereof'20026,376,632'Photoresist polymers of carboxyl-containing alicyclic compounds'20026,372,935'Copolymer resin, preparation thereof, and photoresist using the same'20026,369,181'Copolymer resin, preparation thereof, and photoresist using the same'20026,368,770'Photoresist monomers, polymers thereof, and photoresist compositions containing the same'20026,368,768'Organic anti-reflective coating material and its preparation'20026,359,153'Photoresist monomers and preparation thereof'20026,350,818'Anti reflective coating polymers and the preparation method thereof'20026,348,296'Copolymer resin, preparation thereof, and photoresist using the same'20026,316,162'Polymer and a forming method of a micro pattern using the same'20016,312,865'Semiconductor device using polymer-containing photoresist, and process for manufacturing the same'20016,309,790'Organic anti-reflective coating material and its preparation'20016,291,131'Monomers for photoresist, polymers thereof, and photoresist compositions using the same'20016,265,130'Photoresist polymers of carboxyl-containing alicyclic compounds'20016,262,222'Copolymers containing N-vinyllactam derivatives, preparation methods thereof and photoresists therefrom'20016,248,847'Copolymer resin, preparation thereof, and photoresist using the same'20016,235,447'Photoresist monomers, polymers thereof, and photoresist compositions containing the same'20016,235,448'Photoresist monomers, polymers thereof, and photoresist compositions containing the same'20016,225,020'Polymer and a forming method of a micro pattern using the same'20016,200,731'Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the same'20016,150,069'Oxabicyclo compound, a polymer-containing said compound, and a photoresist micro pattern forming method using the same'20006,132,936'Monomer and polymer for photoresist, and photoresist using the same'20006,051,678'Copolymers containing N-vinyllactam derivatives, preparation methods thereof and photoresists therefrom'20005,955,606'N-vinyllactam derivatives and polymer thereof'19995,750,680'N-vinyllactam derivatives and polymer thereof'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998–2005Patents assigned to HYUNDAI ELECTRONICS IND (50)· patent assignee history
1998–2020Based in Seoul, KR· patent location history
2000–2012Based in Kyungki-do, KR· patent location history
2002–2008Patents assigned to HYNIX SEMICONDUCTOR INC (21)· patent assignee history
2003–2008Based in Ichon-shi, KR· patent location history
2016–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (10)· patent assignee history
2016–2020Based in Suwon-si, KR· patent location history
2017–2019Patents assigned to SK GLOBAL CHEMICAL CO LTD (4)· patent assignee history
2017–2019Patents assigned to SK INNOVATION CO LTD (4)· patent assignee history
2017–2019Based in Daejeon, KR· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HYUNDAI ELECTRONICS IND | 50 | 1998–2005 |
| HYNIX SEMICONDUCTOR INC | 21 | 2002–2008 |
| SAMSUNG ELECTRONICS CO LTD | 10 | 2016–2020 |
| SK GLOBAL CHEMICAL CO LTD | 4 | 2017–2019 |
| SK INNOVATION CO LTD | 4 | 2017–2019 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kyungki-do, KR | 53 | 2000–2012 |
| Suwon-si, KR | 10 | 2016–2020 |
| Ichon-shi, KR | 10 | 2003–2008 |
| Seoul, KR | 6 | 1998–2020 |
| Daejeon, KR | 4 | 2017–2019 |