Inventor
Mehdi Vaez-Iravani
Inventor
Los Gatos, CA, US
Overview
Patents· 86 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties38%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%
G02BOptical elements, systems or apparatus8%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light7%
H01LSemiconductor devices7%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices6%
G01BMeasuring length, thickness or similar linear dimensions4%
H01JElectric discharge tubes or discharge lamps4%
C23CCoating metallic material1%
G01RMeasuring electric variables1%
PatentTitleYear
10,845,317Particle detection for substrate processing202010,816,464Imaging reflectometer202010,705,431Quarter wave light splitting202010,599,044Digital lithography with extended field size202010,527,407In-situ metrology method for thickness measurement during PECVD processes202010,522,375Monitoring system for deposition and method of operation thereof201910,510,624Metrology systems with multiple derivative modules for substrate stress and deformation measurement201910,488,348Wafer inspection201910,474,041Digital lithography with extended depth of focus201910,422,984Flexible mode scanning optical microscopy and inspection system201910,394,130Quarter wave light splitting201910,281,261In-situ metrology method for thickness measurement during PECVD processes20199,989,477Simultaneous multi-spot inspection and imaging20189,978,620Method and apparatus for reducing radiation induced change in semiconductor structures20189,915,622'Wafer inspection'20189,870,935'Monitoring system for deposition and method of operation thereof'20189,679,372'Apparatus and methods for inspecting extreme ultra violet reticles'20179,646,893'Method and apparatus for reducing radiation induced change in semiconductor structures'20179,568,435'Simultaneous multi-spot inspection and imaging'20179,404,873'Wafer inspection with multi-spot illumination and multiple channels'20169,291,575'Wafer inspection'20169,279,774'Wafer inspection'20169,182,358'Multi-spot defect inspection system'20159,176,072'Dark field inspection system with ring illumination'20159,086,389'Sample inspection system detector'20159,068,917'Systems and methods for inspection of a specimen'20159,052,190'Bright-field differential interference contrast system with scanning beams of round and elliptical cross-sections'20158,953,869'Apparatus and methods for inspecting extreme ultra violet reticles'20158,891,079'Wafer inspection'20148,817,248'Simultaneous multi-spot inspection and imaging'20148,817,250'Air bearing for substrate inspection device'20148,765,496'Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis'20148,436,554'LED solar illuminator'20138,283,631'In-situ differential spectroscopy'20128,194,240'Enhanced focusing capability on a sample using a spot matrix'20128,194,301'Multi-spot scanning system and method'20127,989,729'Detecting and repairing defects of photovoltaic devices'20117,978,323'Surface inspection system with improved capabilities'20117,869,023'System for detecting anomalies and/or features of a surface'20117,782,452'Systems and method for simultaneously inspecting a specimen with two distinct channels'20107,746,459'Systems configured to inspect a wafer'20107,733,111'Segmented optical and electrical testing for photovoltaic devices'20107,709,794'Defect detection using time delay lock-in thermography (LIT) and dark field LIT'20107,679,735'Optical system for detecting anomalies and/or features of surfaces'20107,623,229'Systems and methods for inspecting wafers'20097,607,647'Stabilizing a substrate using a vacuum preload air bearing chuck'20097,525,649'Surface inspection system using laser line illumination with two dimensional imaging'20097,492,451'Simultaneous multi-spot inspection and imaging'20097,471,382'Surface inspection system with improved capabilities'20087,385,688'Multi-spot illumination and collection optics for highly tilted wafer planes'20087,365,834'Optical system for detecting anomalies and/or features of surfaces'20087,345,754'Fourier filters and wafer inspection systems'20087,345,752'Multi-spot illumination and collection optics for highly tilted wafer planes'20087,319,229'Illumination apparatus and methods'20087,315,022'High-speed electron beam inspection'20087,295,303'Methods and apparatus for inspecting a sample'20077,280,199'System for detecting anomalies and/or features of a surface'20077,218,392'Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination'20077,130,039'Simultaneous multi-spot inspection and imaging'20067,119,897'Sample inspection system'20067,116,413'Inspection system for integrated applications'20067,088,443'System for detecting anomalies and/or features of a surface'20067,079,238'Sample inspection system'20067,068,363'Systems for inspection of patterned or unpatterned wafers and other specimen'20067,064,821'Sample inspection system'20066,956,644'Systems and methods for a wafer inspection system using multiple angles and multiple wavelength illumination'20056,922,236'Systems and methods for simultaneous or sequential multi-perspective specimen defect inspection'20056,891,611'Sample inspection system'20056,862,096'Defect detection system'20056,781,688'Process for identifying defects in a substrate having non-uniform surface properties'20046,724,473'Method and system using exposure control to inspect a surface'20046,710,876'Metrology system using optical phase'20046,657,715'Sample inspection system'20036,639,662'Sample inspection system'20036,618,134'Sample inspection system'20036,608,676'System for detecting anomalies and/or features of a surface'20036,578,961'Massively parallel inspection and imaging system'20036,538,730'Defect detection system'20036,384,910'Sample inspection system'20026,208,411'Massively parallel inspection and imaging system'20016,201,601'Sample inspection system'20015,798,829'Single laser bright field and dark field system for detecting anomalies of a sample'19985,139,336'Optical measuring apparatus using amplitude modulation of slipt beams'19924,929,836'Focusing in instruments, such as SEMs and CRTs'19904,873,434'Scanning optical microscope using single laser beam'19894,845,362'In situ differential imaging and method utilizing a scanning electron microscope'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–1992Based in Peekskill, NY, US· patent location history
1998–2019Patents assigned to KLA TENCOR CORP (39)· patent assignee history
1998–2007Based in Santa Clara, CA, US· patent location history
2003–2015Patents assigned to KLA TENCOR TECH CORP (28)· patent assignee history
2003–2020Based in Los Gatos, CA, US· patent location history
2012–2016Patents assigned to VAEZ-IRAVANI MEHDI (11)· patent assignee history
2012–2016Patents assigned to ZHAO GUOHENG (8)· patent assignee history
2017–2020Patents assigned to APPLIED MATERIALS INC (14)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| KLA TENCOR CORP | 39 | 1998–2019 |
| KLA TENCOR TECH CORP | 28 | 2003–2015 |
| APPLIED MATERIALS INC | 14 | 2017–2020 |
| VAEZ-IRAVANI MEHDIself | 11 | 2012–2016 |
| ZHAO GUOHENG | 8 | 2012–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Los Gatos, California, US | 69 | 2003–2020 |
| Santa Clara, California, US | 13 | 1998–2007 |
| Peekskill, New York, US | 4 | 1989–1992 |