Inventor
Taketo Ueno
Inventor
Fujisawa, JP
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Nprimary
G01NInvestigating or analysing materials by determining their chemical or physical properties53%
G01BMeasuring length, thickness or similar linear dimensions13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
H05KPrinted circuits5%
G02BOptical elements, systems or apparatus3%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein3%
H01LSemiconductor devices3%
PatentTitleYear
10,228,332Defect inspection device and defect inspection method20199,683,946'Method and device for detecting defects and method and device for observing defects'20179,588,055'Defect inspection apparatus and defect inspection method'20179,535,013'Method and apparatus for inspecting defect'20179,255,793'Defect inspection method and device thereof'20169,182,592'Optical filtering device, defect inspection method and apparatus therefor'20159,019,492'Defect inspection device and defect inspection method'20158,970,836'Defect inspecting apparatus and defect inspecting method'20158,885,037'Defect inspection method and apparatus therefor'20148,830,465'Defect inspecting apparatus and defect inspecting method'20148,804,112'Method of defect inspection and device of defect inspection'20148,681,328'Dark-field defect inspecting method, dark-field defect inspecting apparatus, aberration analyzing method, and aberration analyzing apparatus'20148,660,336'Defect inspection system'20148,289,507'Method of apparatus for detecting particles on a specimen'20128,275,189'Defect inspection system'20127,952,700'Method of apparatus for detecting particles on a specimen'20117,881,520'Defect inspection system'20117,817,261'Method of apparatus for detecting particles on a specimen'20107,643,140'Method and apparatus for inspecting a semiconductor device'20107,369,223'Method of apparatus for detecting particles on a specimen'20087,271,908'Apparatus and method for measuring alignment accuracy, as well as method and system for manufacturing semiconductor device'20076,897,956'Apparatus and method for measuring alignment accuracy, as well as method and system for manufacturing semiconductor device'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2014Based in Fujisawa, JP· patent location history
2007–2019Patents assigned to HITACHI HIGH TECH CORP (20)· patent assignee history
2010–2017Based in Kawasaki, JP· patent location history
2012–2017Patents assigned to UENO TAKETO (12)· patent assignee history
2014–2017Patents assigned to TANIGUCHI ATSUSHI (9)· patent assignee history
2014–2016Patents assigned to SHIBATA YUKIHIRO (7)· patent assignee history
2014–2016Patents assigned to HONDA TOSHIFUMI (4)· patent assignee history
2015–2019Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH CORP | 20 | 2007–2019 |
| UENO TAKETOself | 12 | 2012–2017 |
| TANIGUCHI ATSUSHI | 9 | 2014–2017 |
| SHIBATA YUKIHIRO | 7 | 2014–2016 |
| HONDA TOSHIFUMI | 4 | 2014–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fujisawa, JP | 9 | 2005–2014 |
| Kawasaki, JP | 8 | 2010–2017 |
| Tokyo, JP | 5 | 2015–2019 |