Inventor
Daan Daniel Johannes Antonius Van Sommeren
Inventor
Beuningen, NL
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H01LSemiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation11%
PatentTitleYear
10,725,390Inspection substrate and an inspection method202010,571,810Substrate table, a lithographic apparatus and a method of operating a lithographic apparatus202010,317,804Substrate table, lithographic apparatus and method of operating a lithographic apparatus201910,216,100Inspection substrate and an inspection method201910,120,290Fluid handling structure, immersion lithographic apparatus, and device manufacturing method20189,798,253'Support table for a lithographic apparatus, lithographic apparatus and device manufacturing method'2017Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2017–2020Patents assigned to ASML NETHERLANDS BV (6)· patent assignee history
2017Based in Nijmegen, NL· patent location history
2018–2020Based in Beuningen, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 6 | 2017–2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Beuningen, NL | 5 | 2018–2020 |
| Nijmegen, NL | 1 | 2017 |