Inventor
Douglas S. Armbrust
Inventor
Gloucester, MA, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices42%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1033%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
C23CCoating metallic material8%
PatentTitleYear
7,094,614'In-situ monitoring of chemical vapor deposition process by mass spectrometry'20066,818,992'Self-aligned copper silicide formation for improved adhesion/electromigration'20046,773,952'Semiconductor chip structures with embedded thermal conductors and a thermal sink disposed over opposing substrate surfaces'20046,610,607'Method to define and tailor process limited lithographic features using a modified hard mask process'20036,512,292'Semiconductor chip structures with embedded thermal conductors and a thermal sink disposed over opposing substrate surfaces'20036,251,775'Self-aligned copper silicide formation for improved adhesion/electromigration'2001Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2001–2006Patents assigned to IBM (6)· patent assignee history
2001–2004Based in Colchester, VT, US· patent location history
2003–2006Based in Gloucester, MA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 6 | 2001–2006 |
Locations
| Location | Patents | Span |
|---|---|---|
| Gloucester, Massachusetts, US | 4 | 2003–2006 |
| Colchester, VT, US | 2 | 2001–2004 |