Inventor
Linda K. Somerville
Inventor
Boise, ID, US
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
H10DInorganic electric semiconductor devices30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1030%
PatentTitleYear
7,576,400'Circuitry and gate stacks'20096,580,493'Method and apparatus for exposing semiconductor wafers in a manner that promotes radial processing uniformity'20036,461,950'Semiconductor processing methods, semiconductor circuitry, and gate stacks'20026,403,285'Method for exposing semiconductor wafers in a manner that promotes radial processing uniformity'20026,335,531'Modification of resist and/or resist processing with fluorescence detection'20026,281,100'Semiconductor processing methods'20015,312,717'Residue free vertical pattern transfer with top surface imaging resists'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994Patents assigned to IBM (1)· patent assignee history
1994Based in Bolton, VT, US· patent location history
2001–2009Patents assigned to MICRON TECHNOLOGY INC (6)· patent assignee history
2001–2009Based in Boise, ID, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRON TECHNOLOGY INC | 6 | 2001–2009 |
| IBM | 1 | 1994 |
Locations
| Location | Patents | Span |
|---|---|---|
| Boise, ID, US | 6 | 2001–2009 |
| Bolton, VT, US | 1 | 1994 |