Inventor

Nakaatsu Yoshimura

Inventor
Tokyo, JP

Overview

9→
Patents
2004–2014
Patent span
Physics
Primary field (CPC G)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
Y10TTechnical subjects covered by former us classification13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
B62DMotor vehicles4%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients4%
C08LCompositions of macromolecular compounds4%
C09DCoating compositions, e.g. paints, varnishes or lacquers4%
G01BMeasuring length, thickness or similar linear dimensions4%
G01DMeasuring not specially adapted for a specific variable4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2014Patents assigned to JSR CORP (9)· patent assignee history
2004–2014Based in Tokyo, JP· patent location history
2012–2014Patents assigned to KONNO YOUSUKE (4)· patent assignee history
2012–2014Patents assigned to YOSHIMURA NAKAATSU (4)· patent assignee history
2012–2014Patents assigned to SUGITA HIKARU (2)· patent assignee history
2012–2014Patents assigned to TOYOKAWA FUMIHIRO (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
JSR CORP92004–2014
KONNO YOUSUKE42012–2014
YOSHIMURA NAKAATSUself42012–2014
SUGITA HIKARU22012–2014
TOYOKAWA FUMIHIRO22012–2014
Locations
LocationPatentsSpan
Tokyo, JP92004–2014