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Inventor

Marek Zywno

Inventor
San Jose, CA, US

Overview

17→
Patents
1996–2016
Patent span
Physics
Primary field (CPC G)

Patents· 17 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
F16CShafts12%
G01NInvestigating or analysing materials by determining their chemical or physical properties12%
Y10TTechnical subjects covered by former us classification12%
B25BTools or bench devices not otherwise provided for, for fastening, connecting, disengaging, or holding10%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
H01JElectric discharge tubes or discharge lamps6%
B82YSpecific uses or applications of nanostructures4%
H01LSemiconductor devices4%
PatentTitleYear
9,298,106'Wafer stage with reciprocating wafer stage actuation control'20169,141,002'Z-stage with dynamically driven stage mirror and chuck assembly having constraint'20158,058,628'Substrate processing apparatus and method'20117,897,942'Dynamic tracking of wafer motion and distortion during lithography'20117,633,070'Substrate processing apparatus and method'20097,342,238'Systems, control subsystems, and methods for projecting an electron beam onto a specimen'20086,990,737'Fluid bearings and vacuum chucks and methods for producing same'20066,698,735'Fluid bearings and vacuum chucks and methods for producing same'20046,584,218'Automated photomask inspection apparatus'20036,516,517'Fluid bearings and vacuum chucks and methods for producing same'20036,390,677'Fluid bearings and vacuum chucks and methods for producing same'20026,363,166'Automated photomask inspection apparatus'20026,052,478'Automated photomask inspection apparatus'20005,989,444'Fluid bearings and vacuum chucks and methods for producing same'19995,737,072'Automated photomask inspection apparatus and method'19985,572,598'Automated photomask inspection apparatus'19965,563,702'Automated photomask inspection apparatus and method'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–1998Patents assigned to KLA INSTR CORP (3)· patent assignee history
1996–2016Based in San Jose, CA, US· patent location history
2000–2016Patents assigned to KLA TENCOR CORP (7)· patent assignee history
2006–2016Patents assigned to ZYWNO MAREK (3)· patent assignee history
2008–2009Patents assigned to KLA TENCOR TECH CORP (2)· patent assignee history
2011Patents assigned to BAREKET NOAH (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
KLA TENCOR CORP72000–2016
KLA INSTR CORP31996–1998
ZYWNO MAREKself32006–2016
KLA TENCOR TECH CORP22008–2009
BAREKET NOAH12011
Locations
LocationPatentsSpan
San Jose, California, US171996–2016