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Inventor

Akio Misaka

Inventor
Osaka, JP

Overview

49→
Patents
1991–2021
Patent span
Physics
Primary field (CPC G)

Patents· 49 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices57%
G06FElectric digital data processing13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
Y02PClimate change mitigation technologies in the production or processing of goods8%
H01JElectric discharge tubes or discharge lamps3%
H01LSemiconductor devices3%
H10DInorganic electric semiconductor devices3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
B82YSpecific uses or applications of nanostructures1%
PatentTitleYear
11,092,885Manufacturing methods of semiconductor devices202110,962,874Methods of manufacturing semiconductor devices, method sof performing extreme ultraviolet ray exposure, and methods of performing optical proximity correction20219,658,524'Photomask, and method for creating pattern data thereof, and pattern forming method and processing method using photomask'20179,507,252'Photomask and pattern forming method using photomask'20169,291,889'Photo mask and method for forming pattern using the same'20169,046,783'Photomask, and pattern formation method and exposure apparatus using the photomask'20158,869,079'Semiconductor device and layout design method for the same'20148,392,856'Semiconductor device and layout design method for the same'20138,330,248'Semiconductor device, mask for fabrication of semiconductor device, and optical proximity correction method'20128,278,014'Photomask and pattern formation method using the same'20128,095,894'Changing a design rule for forming LSI pattern based on evaluating effectiveness of optical proximity corrected patterns'20128,007,959'Photomask and pattern formation method using the same'20117,998,641'Photomask and pattern formation method using the same'20117,914,953'Photomask and pattern formation method using the same'20117,897,298'Photomask, photomask fabrication method, pattern formation method using the photomask and mask data creation method'20117,842,436'Photomask'20107,790,337'Photomask, pattern formation method using the same and mask data creation method'20107,771,902'Photomask, fabrication method for the same and pattern formation method using the same'20107,625,678'Mask data creation method'20097,618,754'Pattern formation method'20097,569,312'Mask data creation method'20097,524,620'Pattern formation method'20097,504,186'Photomask, method for producing the same, and method for forming pattern using the photomask'20097,501,213'Method for forming generating mask data'20097,468,240'Patterning method using photomask'20087,449,285'Method for forming pattern'20087,404,165'Method for planning layout for LSI pattern, method for forming LSI pattern and method for generating mask data for LSI'20087,378,198'Photomask'20087,364,822'Photomask, method for forming the same, and method for forming pattern using the photomask'20087,361,436'Pattern formation method'20087,337,423'Mask pattern generating method and mask pattern generating apparatus'20087,332,250'Photomask'20087,282,309'Photomask, method for producing the same, and method for forming pattern using the photomask'20077,250,248'Method for forming pattern using a photomask'20077,205,077'Method for producing photomask and method for producing photomask pattern layout'20077,147,975'Photomask'20067,144,684'Method for forming pattern using photomask'20067,103,870'Method for planning layout for LSI pattern, method for forming LSI pattern and method for generating mask data for LSI'20067,060,398'Photomask, method for producing the same, and method for forming pattern using the photomask'20067,060,395'Photomask, method for forming the same,and method for designing mask pattern'20067,045,255'Photomask and method for producing the same'20067,001,694'Photomask and method for producing the same'20067,001,711'Patterning method using a photomask'20066,977,133'Photomask and pattern forming method'20056,703,168'Photomask'20046,691,297'Method for planning layout for LSI pattern, method for forming LSI pattern and method for generating mask data for LSI'20045,421,934'Dry-etching process simulator'19955,182,718'Method and apparatus for writing a pattern on a semiconductor sample based on a resist pattern corrected for proximity effects resulting from direct exposure of the sample by a charged-particle beam or light'19934,998,020'Electron beam exposure evaluation method'1991

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1991–2008Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (23)· patent assignee history
1991–2013Based in Osaka, JP· patent location history
1995Based in Moriguchi, JP· patent location history
2006–2009Based in Suita, JP· patent location history
2008–2016Patents assigned to PANASONIC CORP (22)· patent assignee history
2012–2013Patents assigned to MISAKA AKIO (4)· patent assignee history
2012–2013Patents assigned to ARAI HIDEYUKI (2)· patent assignee history
2014–2017Based in Toyama, JP· patent location history
2015–2017Patents assigned to PANASONIC IP MAN CO LTD (4)· patent assignee history
2021Based in Hwaseong-si, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD231991–2008
PANASONIC CORP222008–2016
MISAKA AKIOself42012–2013
PANASONIC IP MAN CO LTD42015–2017
ARAI HIDEYUKI22012–2013
Locations
LocationPatentsSpan
Osaka, JP321991–2013
Suita, JP82006–2009
Toyama, JP52014–2017
Hwaseong-si, KR22021
Moriguchi, JP11995