Inventor
Anand S. Murthy
Inventor
Portland, OR, US
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices37%
H10DInorganic electric semiconductor devices37%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1011%
B82YSpecific uses or applications of nanostructures8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
11,011,620Techniques for increasing channel region tensile strain in n-MOS devices202111,004,954Epitaxial buffer to reduce sub-channel leakage in MOS transistors202111,004,978Methods of forming doped source/drain contacts and structures formed thereby202110,998,270Local interconnect for group IV source/drain regions202110,985,263Thin film cap to lower leakage in low band gap material devices202110,978,568Passivation of transistor channel region interfaces202110,957,796Semiconductor device having doped epitaxial region and its methods of fabrication202110,957,769High-mobility field effect transistors with wide bandgap fin cladding202110,944,006Geometry tuning of fin based transistor202110,903,364Semiconductor device with released source and drain202110,892,335Device isolation by fixed charge202110,892,337Backside source/drain replacement for semiconductor devices with metallization on both sides202110,886,408Group III-V material transistors employing nitride-based dopant diffusion barrier layer202110,886,272Techniques for forming dual-strain fins for co-integrated n-MOS and p-MOS devices2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021Patents assigned to INTEL CORP (14)· patent assignee history
2021Based in Portland, OR, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| INTEL CORP | 14 | 2021 |
Locations
| Location | Patents | Span |
|---|---|---|
| Portland, OR, US | 14 | 2021 |