Inventor
SANGJINE PARK
Inventor
KR
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices24%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices15%
F26BDrying solid materials or objects by removing liquid therefrom9%
B25JManipulators4%
H10BElectronic memory devices4%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h104%
B08BCleaning in general3%
H02JElectric power networks3%
H10NElectric solid-state devices not otherwise provided for3%
PatentTitleYear
12,578,647Substrate rotating apparatus, substrate processing system including the same, and substrate processing method using the same202612,523,935Substrate processing method using low temperature developer and semiconductor device manufacturing apparatus using the same202612,463,061Wafer drying apparatus, wafer processing system including the same, and wafer processing method using the same202512,420,316Substrate processing apparatus and substrate processing method202512,422,754Substrate processing apparatus, semiconductor manufacturing equipment, and substrate processing method202512,308,255Apparatus and method for drying substrate202512,287,147Wafer processing equipment and method of manufacturing semiconductor device202512,278,133Substrate transferring unit, substrate processing apparatus, and substrate processing method202512,216,408Apparatus for drying wafer and method for drying wafer202512,211,716Substrate processing apparatus and substrate processing method202512,057,323Substrate processing method, micropattern forming method, and substrate processing apparatus202411,935,772Apparatus for processing a substrate202411,881,426Substrate transferring unit, substrate processing apparatus, and substrate processing method202411,640,115Substrate processing apparatus, semiconductor manufacturing equipment, and substrate processing method202311,527,399Wafer cleaning apparatus based on light irradiation and wafer cleaning system including the same202211,424,202Semiconductor devices having landing pads202211,393,977Semiconductor device including vertical structures and a method of manufacturing the same202211,302,526Supercritical drying apparatus and method of drying substrate using the same202211,217,748Semiconductor device including a data storage material pattern2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to SAMSUNG ELECTRONICS CO LTD (19)· patent assignee history
2022–2026Based in KR· patent location history
2025Patents assigned to SEMES CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SAMSUNG ELECTRONICS CO LTD | 19 | 2022–2026 |
| SEMES CO LTD | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| KR | 19 | 2022–2026 |