Inventor
Hiroaki Morimoto
Inventor
Itami, JP
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G06Fprimary
G06FElectric digital data processing18%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests11%
H01JElectric discharge tubes or discharge lamps8%
B23KSoldering or unsoldering5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
H04LTransmission of digital information, e.g. telegraphic communication5%
H04NPictorial communication, e.g. television5%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
B24BMachines, devices, or processes for grinding or polishing3%
PatentTitleYear
10,466,940Redirecting transmission of content from first HTTPS address to second HTTPS address201910,277,765Information processing device, control method, and program201910,210,264Vehicle-repair support system, server, and computer program201910,185,520Information processing apparatus and method for information processing apparatus for executing print driver maintenance operations201910,055,176Control method and non-transitory computer-readable recording medium20189,836,258Information processing apparatus, control method, and non-transitory computer-readable recording medium20179,007,641'Information processing apparatus, control method, and storage medium'20158,106,915'Display control circuit and display device'20127,227,339'Power generation controller of vehicle power generator'20075,306,663'Method of wiring semiconductor device using energy beam'19945,273,935'Method of controlling etching with a focused charged beam by detecting electrical current or secondary electrons'19935,149,973'Apparatus for wiring semiconductor device using energy beam and wiring method by using the same'19925,141,880'Manufacturing method of a junction gate field effect transistor'19925,043,290'Process for forming electrodes for semiconductor devices by focused ion beam technology'19914,962,059'Process for forming electrodes for semiconductor devices using focused ion beam deposition'19904,952,421'Method for repairing a pattern'19904,948,749'Process for forming electrodes for semiconductor devices'19904,873,163'Photomask material'19894,853,341'Process for forming electrodes for semiconductor devices using focused ion beams'19894,843,238'Method for identifying a blistered film in layered films'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–2007Patents assigned to MITSUBISHI ELECTRIC CORP (12)· patent assignee history
1989–1993Based in Itami, JP· patent location history
1990–1994Based in Hyogo, JP· patent location history
2012Patents assigned to FUJITSU SEMICONDUCTOR LTD (1)· patent assignee history
2012Patents assigned to KAWANO SHINTAROU (1)· patent assignee history
2012–2015Based in Tokyo, JP· patent location history
2015–2019Patents assigned to CANON KK (6)· patent assignee history
2017–2019Based in Yokohama, JP· patent location history
2019Patents assigned to DENSO CORP (1)· patent assignee history
2019Based in Kariya, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI ELECTRIC CORP | 12 | 1989–2007 |
| CANON KK | 6 | 2015–2019 |
| DENSO CORP | 1 | 2019 |
| FUJITSU SEMICONDUCTOR LTD | 1 | 2012 |
| KAWANO SHINTAROU | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Itami, JP | 7 | 1989–1993 |
| Yokohama, JP | 5 | 2017–2019 |
| Hyogo, JP | 4 | 1990–1994 |
| Tokyo, JP | 2 | 2012–2015 |
| Kariya, JP | 1 | 2019 |