Inventor

Wen Tan

Inventor
Shanghai, CN

Overview

6→
Patents
2016–2020
Patent span
Performing operations
Primary field (CPC B)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G06Fprimary
G06FElectric digital data processing21%
B22FWorking metallic powder7%
B23KSoldering or unsoldering7%
B23PMetal-working not otherwise provided for7%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering7%
C22CAlloys7%
F04DNon-positive-displacement pumps7%
G21KHandling of particles or ionising radiation not otherwise provided for7%
H01LSemiconductor devices7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2016–2020Patents assigned to INTEL CORP (3)· patent assignee history
2016–2017Patents assigned to LI JIANHUI (2)· patent assignee history
2016–2017Patents assigned to TAN WEN (2)· patent assignee history
2016–2017Patents assigned to WU YONG (2)· patent assignee history
2016–2020Based in Shanghai, CN· patent location history
2016Based in Hsinchu, TW· patent location history
2018–2019Patents assigned to GEN ELECTRIC (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INTEL CORP32016–2020
GEN ELECTRIC22018–2019
LI JIANHUI22016–2017
TAN WENself22016–2017
WU YONG22016–2017
Locations
LocationPatentsSpan
Shanghai, CN52016–2020
Hsinchu, TW12016