Inventor
TAKAHIRO KOJIMA
Inventor
JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
G03GElectrography17%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients6%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
G06FElectric digital data processing6%
H01GCapacitors6%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry3%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
C01GCompounds containing metals not covered by subclasses c01d or c01f3%
PatentTitleYear
12,485,659Attachment configuration of and method for applying decorative laminates202512,479,972Resin composition and resin molded body thereof202512,411,408Resist composition and method of forming resist pattern202512,399,455Image forming apparatus202512,293,118Image forming device202512,152,140Conductive resin composition, resin molded body, and article202411,822,240Resist composition and method of forming resist pattern202311,731,992Method for preparing halosilane compounds202311,693,313Resist composition and method of forming resist pattern202311,681,478Image forming device202311,586,111Resist composition and method of forming resist pattern202311,532,436Multilayer ceramic electronic component including outer electrodes connected to metal terminals202211,515,093Multilayer ceramic capacitor and mounting structure of the multilayer ceramic capacitor202211,392,033Resist composition and method of forming resist pattern202211,372,361Image forming unit and image forming apparatus202211,372,358Image forming apparatus202211,320,762Image forming apparatus202211,275,306Resist composition and method of forming resist pattern202211,187,981Resist composition and method of forming resist pattern2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to TOKYO OHKA KOGYO CO LTD (7)· patent assignee history
2021–2025Based in JP· patent location history
2022–2025Patents assigned to TOSHIBA TEC KK (6)· patent assignee history
2022Patents assigned to MURATA MANUFACTURING CO (2)· patent assignee history
2024–2025Patents assigned to CANON KK (2)· patent assignee history
2025Patents assigned to AICA KOGYO CO LTD (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO OHKA KOGYO CO LTD | 7 | 2021–2025 |
| TOSHIBA TEC KK | 6 | 2022–2025 |
| CANON KK | 2 | 2024–2025 |
| MURATA MANUFACTURING CO | 2 | 2022 |
| AICA KOGYO CO LTD | 1 | 2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 19 | 2021–2025 |