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Inventor

Wendelin Johanna Maria Versteeg

Inventor
Eindhoven, NL

Overview

2→
Patents
2014–2019
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
10,310,394Lithographic apparatus, a projection system and a device manufacturing method20198,711,325'Method and system for determining a suppression factor of a suppression system and a lithographic apparatus'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2019Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2014Patents assigned to FRERIKS HANS JOHANNES MARIA (1)· patent assignee history
2014Patents assigned to HAAST MARC ANTONIUS MARIA (1)· patent assignee history
2014Patents assigned to JONKERS PETER GERARDUS (1)· patent assignee history
2014Patents assigned to LABETSKI DZMITRY (1)· patent assignee history
2014–2019Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22014–2019
FRERIKS HANS JOHANNES MARIA12014
HAAST MARC ANTONIUS MARIA12014
JONKERS PETER GERARDUS12014
LABETSKI DZMITRY12014
Locations
LocationPatentsSpan
Eindhoven, NL22014–2019