Inventor
Kyusaku Nishioka
Inventor
Itami, JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps36%
H10DInorganic electric semiconductor devices18%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests18%
C23CCoating metallic material9%
H05HPlasma technique9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h109%
PatentTitleYear
5,304,775'Method of etching a wafer having high anisotropy with a plasma gas containing halogens and in inert element'19945,070,030'Method of making an oxide isolated, lateral bipolar transistor'19914,990,991'Bipolar transistor and method of manufacturing the same'19914,982,138'Semiconductor wafer treating device utilizing a plasma'19914,915,979'Semiconductor wafer treating device utilizing ECR plasma'19904,891,095'Method and apparatus for plasma treatment'19904,877,509'Semiconductor wafer treating apparatus utilizing a plasma'1989Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1989–1994Patents assigned to MITSUBISHI ELECTRIC CORP (7)· patent assignee history
1989–1994Based in Itami, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI ELECTRIC CORP | 7 | 1989–1994 |
Locations
| Location | Patents | Span |
|---|---|---|
| Itami, JP | 7 | 1989–1994 |