Inventor
Fusayoshi Sakurai
Inventor
Yokohama, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests33%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds17%
PatentTitleYear
6,025,098'Photosensitive composition and photosensitive rubber plate'20005,863,704'Photosensitive composition and photosensitive rubber plate'19995,830,621'Photosensitive elastomer composition and photosensitive rubber plate'19985,679,485'Photosensitive composition, photosensitive rubber plate and process for producing same, and flexographic plate and process for producing same'19975,281,510'Photosensitive elastomeric composition'19944,980,269'Photosensitive elastomeric composition'1990Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1990–2000Patents assigned to NIPPON ZEON CO (6)· patent assignee history
1990–1994Based in Yokosuka, JP· patent location history
1997–2000Based in Yokohama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| NIPPON ZEON CO | 6 | 1990–2000 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 4 | 1997–2000 |
| Yokosuka, JP | 2 | 1990–1994 |