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Inventor

Greja Johanna Adriana Maria Verheijden

Inventor
Riethoven, NL

Overview

14→
Patents
2008–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 14 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B81Cprimary
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems23%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%
H10DInorganic electric semiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
H02NElectric machines not otherwise provided for10%
H01LSemiconductor devices8%
B81BMicrostructural devices or systems, e.g. micromechanical devices3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H03HImpedance networks, e.g. resonant circuits3%
Y10TTechnical subjects covered by former us classification3%
PatentTitleYear
10,171,007Method of manufacturing a device with a cavity20199,859,818'Micro-device with a cavity'20188,980,698'MEMS devices'20158,906,729'Method of manufacturing a device with a cavity'20148,872,359'MEMS devices'20148,426,928'Device with microstructure and method of forming such a device'20138,367,552'Method for fabrication of in-laid metal interconnects'20138,330,238'Microscopic structure packaging method and device with packaged microscopic structure'20128,310,053'Method of manufacturing a device with a cavity'20128,273,653'Microscopic structure packaging method and device with packaged microscopic structure'20128,012,872'Planarising damascene structures'20117,736,948'Method of manufacturing a plurality of semiconductor devices and carrier substrate'20107,589,425'Method of manufacturing a semiconductor device having damascene structures with air gaps'20097,361,453'Method for creating a pattern in a material and semiconductor structure processed therewith'2008

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2008–2011Based in Valkenswaard, NL· patent location history
2010–2013Based in Leuven, BE· patent location history
2011–2015Patents assigned to NXP BV (6)· patent assignee history
2012–2014Patents assigned to VERHEIJDEN GREJA JOHANNA ADRIANA MARIA (6)· patent assignee history
2012–2015Patents assigned to KOOPS GERHARD (5)· patent assignee history
2012–2013Patents assigned to DAAMEN ROEL (3)· patent assignee history
2012–2014Patents assigned to TAIWAN SEMICONDUCTOR MFG (3)· patent assignee history
2012–2019Based in Riethoven, NL· patent location history
2012Based in Reithoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NXP BV62011–2015
VERHEIJDEN GREJA JOHANNA ADRIANA MARIAself62012–2014
KOOPS GERHARD52012–2015
DAAMEN ROEL32012–2013
TAIWAN SEMICONDUCTOR MFG32012–2014
Locations
LocationPatentsSpan
Riethoven, NL82012–2019
Valkenswaard, NL32008–2011
Leuven, BE22010–2013
Reithoven, NL12012