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Inventor

Yasuyuki Kobayakawa

Inventor
Tokyo, JP

Overview

2→
Patents
2005–2006
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary
B01DSeparation20%
C09GPolishing compositions20%
C23FNon-mechanical removal of metallic material from surface20%
C25DProcesses for the electrolytic or electrophoretic production of coatings20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
7,101,517'Processing solution preparation and supply method and apparatus'20066,875,359'Developer waste liquid regenerating apparatus and method'2005

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2005–2006Patents assigned to NAGASE CMS TECHNOLOGY CO LTD (2)· patent assignee history
2005Patents assigned to NAGASE & CO LTD (1)· patent assignee history
2005–2006Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NAGASE CMS TECHNOLOGY CO LTD22005–2006
NAGASE & CO LTD12005
Locations
LocationPatentsSpan
Tokyo, JP22005–2006