Inventor

Kuniaki Matsuda

Inventor
Sapporo, JP

Overview

10→
Patents
2004–2021
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G06Fprimary
G06FElectric digital data processing37%
B29CShaping or joining of plastics11%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts5%
B29LIndexing scheme associated with subclass b29c, relating to particular articles5%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%
C08LCompositions of macromolecular compounds5%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices5%
G03HHolographic processes or apparatus5%
G11BInformation storage based on relative movement between record carrier and transducer5%
H02JElectric power networks5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2010Patents assigned to SEIKO EPSON CORP (8)· patent assignee history
2004–2010Based in Sapporo, JP· patent location history
2010Patents assigned to HITACHI MAXELL (1)· patent assignee history
2010Patents assigned to INPHASE TECH INC (1)· patent assignee history
2010Based in Ohsaka, JP· patent location history
2021Patents assigned to POLYPLASTICS CO (1)· patent assignee history
2021Based in Fuji, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SEIKO EPSON CORP82004–2010
HITACHI MAXELL12010
INPHASE TECH INC12010
POLYPLASTICS CO12021
Locations
LocationPatentsSpan
Sapporo, JP82004–2010
Fuji, JP12021
Ohsaka, JP12010