Inventor
Hidetaka Nakao
Inventor
Tokyo, JP
Overview
Patents· 10 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
B24Bprimary
B24BMachines, devices, or processes for grinding or polishing32%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H01LSemiconductor devices11%
Y10TTechnical subjects covered by former us classification11%
B08BCleaning in general4%
B25JManipulators4%
G05BControl or regulating systems in general4%
Y02PClimate change mitigation technologies in the production or processing of goods4%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%
PatentTitleYear
10,688,622Substrate processing apparatus20209,555,517'Film thickness signal processing apparatus, polishing apparatus, film thickness signal processing method, and polishing method'20179,144,881'Polishing apparatus and polishing method'20158,388,409'Substrate polishing apparatus'20138,206,197'Polishing apparatus and program thereof'20128,078,306'Polishing apparatus and polishing method'20118,038,136'Hand having rocking mechanism and substrate delivering device having the same'2011RE038215'Polishing apparatus'20036,074,276'Polishing apparatus'20005,885,134'Polishing apparatus'1999Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1999–2020Patents assigned to EBARA CORP (10)· patent assignee history
1999–2003Based in Ebina, JP· patent location history
2011–2013Patents assigned to NAKAO HIDETAKA (3)· patent assignee history
2011–2013Patents assigned to TOSHIBA KK (2)· patent assignee history
2011Patents assigned to ASHIHARA TAKESHI (1)· patent assignee history
2011Patents assigned to HAYAKAWA ISAO (1)· patent assignee history
2011–2020Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EBARA CORP | 10 | 1999–2020 |
| NAKAO HIDETAKAself | 3 | 2011–2013 |
| TOSHIBA KK | 2 | 2011–2013 |
| ASHIHARA TAKESHI | 1 | 2011 |
| HAYAKAWA ISAO | 1 | 2011 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 7 | 2011–2020 |
| Ebina, JP | 3 | 1999–2003 |