Inventor

Robertus Johannes Marinus De Jongh

Inventor
Eindhoven, NL

Overview

10→
Patents
2006–2019
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices83%
G02BOptical elements, systems or apparatus8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2019Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2006–2018Based in Eindhoven, NL· patent location history
2012–2015Patents assigned to DE JONGH ROBERTUS JOHANNES MARINUS (4)· patent assignee history
2012–2015Patents assigned to BUTLER HANS (3)· patent assignee history
2012–2015Patents assigned to VAN DER WIJST MARC WILHELMUS MARIA (3)· patent assignee history
2014–2015Patents assigned to WIJCKMANS MAURICE WILLEM JOZEF ETIËNNE (3)· patent assignee history
2019Based in Veldhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV102006–2019
DE JONGH ROBERTUS JOHANNES MARINUSself42012–2015
BUTLER HANS32012–2015
VAN DER WIJST MARC WILHELMUS MARIA32012–2015
WIJCKMANS MAURICE WILLEM JOZEF ETIËNNE32014–2015
Locations
LocationPatentsSpan
Eindhoven, NL92006–2018
Veldhoven, NL12019