Inventor
Gerardus Hubertus Petrus Maria Swinkels
Inventor
Eindhoven, NL
Overview
Patents· 32 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices37%
H05GX-ray technique33%
G21KHandling of particles or ionising radiation not otherwise provided for7%
B82YSpecific uses or applications of nanostructures5%
G02BOptical elements, systems or apparatus2%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light2%
H05KPrinted circuits2%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
B03CMagnetic or electrostatic separation of solid materials from solid materials or fluids1%
B08BCleaning in general1%
PatentTitleYear
10,001,709Lithographic apparatus, spectral purity filter and device manufacturing method20189,964,852Source collector apparatus, lithographic apparatus and method20189,841,680'Source collector apparatus, lithographic apparatus and method'20179,648,714'Fuel system for lithographic apparatus, EUV source, lithographic apparatus and fuel filtering method'20179,632,419'Radiation source'20179,594,306'Lithographic apparatus, spectral purity filter and device manufacturing method'20179,411,238'Source-collector device, lithographic apparatus, and device manufacturing method'20169,414,477'Radiation source, lithographic apparatus and device manufacturing method'20169,366,967'Radiation source'20169,363,879'Module and method for producing extreme ultraviolet radiation'20169,164,403'Radiation source, lithographic apparatus and device manufacturing method'20159,119,280'Radiation source'20159,110,377'Lithographic apparatus, EUV radiation generation apparatus and device manufacturing method'20159,097,982'Radiation system, radiation collector, radiation beam conditioning system, spectral purity filter for radiation system and method for forming a spectral purity filter'20159,091,944'Source collector, lithographic apparatus and device manufacturing method'20159,007,560'Radiation source'20158,946,661'Radiation source, lithographic apparatus and device manufacturing method'20158,901,521'Module and method for producing extreme ultraviolet radiation'20148,755,032'Radiation source and lithographic apparatus'20148,749,756'Lithographic apparatus and device manufacturing method'20148,711,325'Method and system for determining a suppression factor of a suppression system and a lithographic apparatus'20148,598,551'EUV radiation source comprising a droplet accelerator and lithographic apparatus'20138,547,525'EUV radiation generation apparatus'20138,507,882'Radiation source and lithographic apparatus'20138,462,826'Laser device'20138,431,916'Radiation source and lithographic apparatus'20138,405,055'Source module, radiation source and lithographic apparatus'20138,373,846'Radiation source, lithographic apparatus and device manufacturing method'20138,368,040'Radiation system and lithographic apparatus'20138,368,032'Radiation source, lithographic apparatus, and device manufacturing method'20138,115,900'Lithographic apparatus and device manufacturing method'20127,883,886'Device for cereal malting'2011Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2011Based in Aarle-Rixtel, NL· patent location history
2012–2018Patents assigned to ASML NETHERLANDS BV (31)· patent assignee history
2012–2017Patents assigned to SWINKELS GERARDUS HUBERTUS PETRUS MARIA (24)· patent assignee history
2012–2015Patents assigned to LABETSKI DZMITRY (8)· patent assignee history
2012–2018Based in Eindhoven, NL· patent location history
2013–2017Patents assigned to LOOPSTRA ERIK ROELOF (18)· patent assignee history
2013–2017Patents assigned to BANINE VADIM YEVGENYEVICH (10)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 31 | 2012–2018 |
| SWINKELS GERARDUS HUBERTUS PETRUS MARIAself | 24 | 2012–2017 |
| LOOPSTRA ERIK ROELOF | 18 | 2013–2017 |
| BANINE VADIM YEVGENYEVICH | 10 | 2013–2017 |
| LABETSKI DZMITRY | 8 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 31 | 2012–2018 |
| Aarle-Rixtel, NL | 1 | 2011 |