Inventor
Norman E. Schumaker
Inventor
Austin, TX, US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
B82YSpecific uses or applications of nanostructures15%
B29CShaping or joining of plastics9%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems9%
C30BSingle-crystal growth7%
B29DProducing particular articles from plastics or from substances in a plastic state6%
C23CCoating metallic material6%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests6%
PatentTitleYear
8,318,066'Step and repeat imprint lithography process'20127,943,081'Step and repeat imprint lithography processes'20117,727,453'Step and repeat imprint lithography processes'20107,635,445'Method of separating a mold from a solidified layer disposed on a substrate'20097,261,830'Applying imprinting material to substrates employing electromagnetic fields'20077,224,443'Imprint lithography substrate processing tool for modulating shapes of substrates'20077,077,992'Step and repeat imprint lithography processes'20067,070,405'Alignment systems for imprint lithography'20067,019,819'Chucking system for modulating shapes of substrates'20066,982,783'Chucking system for modulating shapes of substrates'20066,980,282'Method for modulating shapes of substrates'20056,900,881'Step and repeat imprint lithography systems'20054,969,416'Gas treatment apparatus and method'19904,838,983'Gas treatment apparatus and method'19894,772,356'Gas treatment apparatus and method'19884,313,125'Light emitting semiconductor devices'19823,964,157'Method of mounting semiconductor chips'19763,950,195'LPE technique for reducing edge growth'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1982Patents assigned to BELL TELEPHONE LABOR INC (3)· patent assignee history
1976–1990Based in Warren, NJ, US· patent location history
1976Based in North Plainfield, NJ, US· patent location history
1982Based in Warren Township, NJ, US· patent location history
1988–1990Patents assigned to EMCORE INC (3)· patent assignee history
2005–2012Patents assigned to MOLECULAR IMPRINTS INC (11)· patent assignee history
2005–2012Based in Austin, TX, US· patent location history
2012Patents assigned to CHOI BYUNG-JIN (1)· patent assignee history
2012Patents assigned to MEISSL MARIO JOHANNES (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MOLECULAR IMPRINTS INC | 11 | 2005–2012 |
| BELL TELEPHONE LABOR INC | 3 | 1976–1982 |
| EMCORE INC | 3 | 1988–1990 |
| CHOI BYUNG-JIN | 1 | 2012 |
| MEISSL MARIO JOHANNES | 1 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Austin, Texas, US | 12 | 2005–2012 |
| Warren, New Jersey, US | 4 | 1976–1990 |
| Warren Township, New Jersey, US | 1 | 1982 |
| North Plainfield, New Jersey, US | 1 | 1976 |