Inventor
Shinobu Sugimura
Inventor
Yokohama, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G11Bprimary
G11BInformation storage based on relative movement between record carrier and transducer24%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems6%
C03CChemical composition of glasses, glazes or vitreous enamels6%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%
H01LSemiconductor devices6%
Y10TTechnical subjects covered by former us classification6%
B82YSpecific uses or applications of nanostructures4%
G02BOptical elements, systems or apparatus4%
PatentTitleYear
10,877,374Pattern formation method and pattern formation material202010,672,621Pattern forming material, pattern forming method, and method for manufacturing semiconductor device202010,553,443Pattern formation method202010,534,260Pattern formation method20209,927,376'Template defect inspection method'20189,196,273'Magnetoresistive element with three terminals, magnetic head, and magnetic recording and reproducing apparatus'20159,142,228'Magnetic recording head having narrow write gap, and disk device provided with the same'20159,117,465'Non-local spin valve element with three terminals, hard disk head, and magnetic recording and reproducing apparatus'20158,908,329'Magnetic head with beveled main pole and spin torque oscillator, method of manufacturing the same, and magnetic recording/reproduction apparatus'20148,840,258'Antireflection structure formation method and antireflection structure'20148,829,070'Ultraviolet-curable resin material for pattern transfer and magnetic recording medium manufacturing method using the same'20148,778,162'Stamper and method of manufacturing the same'20148,361,339'Antireflection structure formation method and antireflection structure'20138,343,362'Stamper manufacturing method'20138,308,965'Stamper, method of manufacturing the stamper, and magnetic recording medium manufacturing method using the stamper'20128,173,029'Magnetic recording medium manufacturing method'20127,938,978'Method of manufacturing stamper'20117,833,458'Imprinting method and stamper'20107,738,213'Magnetic disk medium, reticle and magnetic recording and reproducing apparatus'2010Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2010–2015Patents assigned to TOSHIBA KK (14)· patent assignee history
2010–2020Based in Yokohama, JP· patent location history
2012–2014Patents assigned to SUGIMURA SHINOBU (7)· patent assignee history
2012–2014Patents assigned to SAKURAI MASATOSHI (5)· patent assignee history
2012–2014Patents assigned to MORITA SEIJI (3)· patent assignee history
2015–2020Based in Kanagawa, JP· patent location history
2018–2020Patents assigned to TOSHIBA MEMORY CORP (5)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOSHIBA KK | 14 | 2010–2015 |
| SUGIMURA SHINOBUself | 7 | 2012–2014 |
| SAKURAI MASATOSHI | 5 | 2012–2014 |
| TOSHIBA MEMORY CORP | 5 | 2018–2020 |
| MORITA SEIJI | 3 | 2012–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 14 | 2010–2020 |
| Kanagawa, JP | 5 | 2015–2020 |