Inventor

SHENG-KANG YU

Inventor

Overview

46→

Patents

2022–2026

Patent span

Physics

Primary field (CPC G)

Patents· 46 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices39%

H05GX-ray technique28%

G21KHandling of particles or ionising radiation not otherwise provided for8%

G02BOptical elements, systems or apparatus5%

G06TImage data processing or generation, in general3%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h103%

G05BControl or regulating systems in general3%

B66CCranes2%

G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%

G06NComputing arrangements based on specific computational models2%

PatentTitleYear

12,560,868System and method for omnidirectional real time detection of photolithography characteristics2026 12,541,152EUV lithography system with 3D sensing and tunning modules2026 12,520,385Semiconductor processing tool and methods of operation2026 12,510,827EUV radiation source apparatus for lithography2025 12,487,534Semiconductor processing tool and methods of operation2025 12,461,454Semiconductor processing tool and method of using the same2025 12,449,734Lithography apparatus and method2025 12,422,755Semiconductor processing tool and methods of operation2025 12,405,529Lithography system and methods2025 12,372,878Inspection system for extreme ultraviolet (EUV) light source2025 12,372,887Methods of cleaning a lithography system2025 12,372,886Acoustic particle deflection in lithography tool2025 12,360,458Radiation collector2025 12,353,142Semiconductor processing tool and methods of operation2025 12,287,572Lithography system and methods2025 12,235,593System and method for dynamically controlling temperature of thermostatic reticles2025 12,228,863EUV light source contamination monitoring system2025 12,216,413Device and method to remove debris from an extreme ultraviolet (EUV) lithography system2025 12,210,295Reticle cleaning device and method of use2025 12,189,298EUV vessel perimeter flow auto adjustment2025 12,119,129EUV lithography apparatus2024 12,096,543Method for using radiation source apparatus2024 12,096,544Lithography thermal control2024 12,078,933System and method for omnidirectional real time detection of photolithography characteristics2024 12,066,761Inspection tool for an extreme ultraviolet radiation source to observe tin residual2024 12,061,423Method and apparatus for mitigating tin debris2024 12,019,378Methods of cleaning a lithography system2024 12,007,694Lithography apparatus and method2024 11,948,702Radiation source apparatus and method for using the same2024 11,906,902Semiconductor processing tool and methods of operation2024 11,854,846System for a semiconductor fabrication facility and method for operating the same2023 11,852,978EUV lithography system with 3D sensing and tunning modules2023 11,841,625Device and method to remove debris from an extreme ultraviolet (EUV) lithography system2023 11,822,259Acoustic particle deflection in lithography tool2023 11,747,735EUV vessel perimeter flow auto adjustment2023 11,693,326System and method for dynamically controlling temperature of thermostatic reticles2023 11,694,820Radiation source apparatus and method for using the same2023 11,650,512Reticle cleaning device and method of use2023 11,647,578Lithography thermal control2023 11,605,477EUV lithography apparatus2023 11,567,415Inspection system for extreme ultraviolet (EUV) light source2023 11,553,581Radiation source apparatus and method for using the same2023 11,537,053Semiconductor processing tool and methods of operation2022 11,513,441EUV radiation source apparatus for lithography2022 11,380,566System for a semiconductor fabrication facility and method for operating the same2022 11,243,479Method of operating semiconductor apparatus and semiconductor apparatus2022

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2026Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (46)· patent assignee history

2022–2026Based in TW· patent location history

2026Patents assigned to TAIWAN SEMCONDUCTOR MFG COMPANY LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
TAIWAN SEMICONDUCTOR MFG CO LTD	46	2022–2026
TAIWAN SEMCONDUCTOR MFG COMPANY LTD	1	2026

Locations

Location	Patents	Span
TW	46	2022–2026