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Inventor

FUMITOSHI OIKAWA

Inventor
JP

Overview

4→
Patents
2024–2025
Patent span
Electricity
Primary field (CPC H)

Patents· 4 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B08Bprimary
B08BCleaning in general29%
H01LSemiconductor devices29%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
B24BMachines, devices, or processes for grinding or polishing14%
PatentTitleYear
12,370,578Substrate cleaning apparatus and substrate cleaning method202512,205,831Cleaning apparatus and polishing apparatus202512,100,587Substrate cleaning apparatus and cleaning method of substrate202411,948,811Cleaning apparatus and polishing apparatus2024

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2024–2025Patents assigned to EBARA CORP (4)· patent assignee history
2024–2025Based in JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP42024–2025
Locations
LocationPatentsSpan
JP42024–2025