Inventor
Simon Gijsbert Josephus Mathijssen
Inventor
Rosmalen, NL
Overview
Patents· 46 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices35%
G01BMeasuring length, thickness or similar linear dimensions14%
G01NInvestigating or analysing materials by determining their chemical or physical properties14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
G02BOptical elements, systems or apparatus5%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein5%
H05GX-ray technique5%
H01SDevices using the process of light amplification by stimulated emission of radiation [laser] to amplify or generate light4%
H01LSemiconductor devices3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
PatentTitleYear
11,022,900Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method202110,983,361Methods of aligning a diffractive optical system and diffracting beams, diffractive optical element and apparatus202110,942,460Mark position determination method202110,908,513Metrology method and apparatus and computer program202110,816,906HHG source, inspection apparatus and method for performing a measurement202010,788,766Metrology sensor, lithographic apparatus and method for manufacturing devices202010,761,432Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method202010,705,437Metrology method and apparatus, computer program and lithographic system202010,656,533Metrology in lithographic processes202010,648,919Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus202010,649,344Illumination source for an inspection apparatus, inspection apparatus and inspection method202010,630,037Apparatus for delivering gas and illumination source for generating high harmonic radiation202010,607,873Substrate edge detection202010,599,047Metrology apparatus, lithographic system, and method of measuring a structure202010,585,363Alignment system202010,530,111Apparatus for delivering gas and illumination source for generating high harmonic radiation202010,527,959Position sensor, lithographic apparatus and method for manufacturing devices202010,514,620Alignment method201910,474,039Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing method201910,466,601Alignment sensor for lithographic apparatus201910,451,978Metrology parameter determination and metrology recipe selection201910,451,559Illumination source for an inspection apparatus, inspection apparatus and inspection method201910,416,577Position measuring method of an alignment target201910,386,735Lithographic apparatus alignment sensor and method201910,379,448Methods and apparatus for predicting performance of a measurement method, measurement method and apparatus201910,330,606Illumination source for an inspection apparatus, inspection apparatus and inspection method201910,267,744Illumination source for an inspection apparatus, inspection apparatus and inspection method201910,234,771HHG source, inspection apparatus and method for performing a measurement201910,133,192Method and apparatus for determining the property of a structure, device manufacturing method201810,101,675Metrology apparatus, method of measuring a structure and lithographic apparatus201810,067,068Lithographic apparatus and method for performing a measurement201810,048,596Method and apparatus for generating illuminating radiation20189,970,747Position measurement with illumination profile having two diametrically opposed off-axis radiation20189,958,791Inspection apparatus and methods, substrates having metrology targets, lithographic system and device manufacturing method20189,939,742Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method20189,927,726'Polarization independent interferometer'20189,857,703'Alignment sensor and lithographic apparatus'20189,835,954Inspection method and apparatus, substrates for use therein and device manufacturing method20179,778,025'Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method'20179,733,572'Method and apparatus for measuring asymmetry of a microstructure, position measuring method, position measuring apparatus, lithographic apparatus and device manufacturing method'20179,632,039'Inspection apparatus, inspection method and manufacturing method'20179,606,442'Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method'20179,551,939'Mark position measuring apparatus and method, lithographic apparatus and device manufacturing method'20179,547,241'Alignment sensor, lithographic apparatus and alignment method'20179,506,743'Position measuring apparatus, position measuring method, lithographic apparatus and device manufacturing method'20169,279,657'Level sensor arrangement in a lithographic apparatus for measuring multi-layer surfaces'2016Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2016–2021Patents assigned to ASML NETHERLANDS BV (46)· patent assignee history
2016–2019Patents assigned to ASML HOLDING NV (8)· patent assignee history
2016Patents assigned to DEN BOEF ARIE JEFFREY (1)· patent assignee history
2016Patents assigned to MATHIJSSEN SIMON GIJSBERT JOSEPHUS (1)· patent assignee history
2016–2018Based in Den Bosch, NL· patent location history
2017Patents assigned to STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE (1)· patent assignee history
2017–2021Based in Rosmalen, NL· patent location history
2018–2021Based in Veldhoven, NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 46 | 2016–2021 |
| ASML HOLDING NV | 8 | 2016–2019 |
| DEN BOEF ARIE JEFFREY | 1 | 2016 |
| MATHIJSSEN SIMON GIJSBERT JOSEPHUSself | 1 | 2016 |
| STICHTING VOOR FUNDAMENTEEL ONDERZOEK DER MATERIE | 1 | 2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Rosmalen, NL | 31 | 2017–2021 |
| Den Bosch, NL | 11 | 2016–2018 |
| Veldhoven, NL | 4 | 2018–2021 |