Inventor
Tetsuro Takahashi
Inventor
Nirasaki, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1018%
G06FElectric digital data processing16%
H01JElectric discharge tubes or discharge lamps11%
B08BCleaning in general5%
F02MSupplying combustion engines in general with combustible mixtures or constituents thereof5%
G10KSound-producing devices5%
H01LSemiconductor devices5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling3%
B65HHandling thin or filamentary material, e.g. sheets, webs, cables3%
PatentTitleYear
10,460,949Substrate processing apparatus, substrate processing method and storage medium201910,303,709Population formation method, population formation apparatus, and computer-readable recording medium20199,916,376'Digital document keyword generation'20189,790,903'Intake sound introducing apparatus'20179,714,535'Vehicle having opening-closing control function'20179,691,630'Etching method'20179,582,758'Data classification method, storage medium, and classification device'20179,429,117'Intake sound introducing apparatus'20168,608,901'Process chamber cleaning method in substrate processing apparatus, substrate processing apparatus, and substrate processing method'20138,316,026'Method and system for keyword management'20128,244,773'Keyword output apparatus and method'20127,915,179'Insulating film forming method and substrate processing method'20117,857,984'Plasma surface treatment method, quartz member, plasma processing apparatus and plasma processing method'20107,842,621'Method of measuring nitrogen concentration, method of forming silicon oxynitride film, and method of manufacturing semiconductor device.'20107,695,763'Method for cleaning process chamber of substrate processing apparatus, substrate processing apparatus, and method for processing substrate'20107,599,926'Reputation information processing program, method, and apparatus'20095,152,513'Sheet reversing apparatus for individual sheet feeding'19924,992,957'Printer and method for utilizing character codes and control codes within a printer'19914,510,668'Machining center'1985Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2009–2019Patents assigned to FUJITSU LTD (6)· patent assignee history
2009–2012Based in Kawasaki, JP· patent location history
2010–2019Patents assigned to TOKYO ELECTRON LTD (7)· patent assignee history
2010–2019Based in Nirasaki, JP· patent location history
2012–2013Patents assigned to TAKAHASHI TETSURO (3)· patent assignee history
2012Patents assigned to OKAMOTO SEISHI (2)· patent assignee history
2016–2017Patents assigned to FUJI HEAVY IND LTD (3)· patent assignee history
2016–2017Based in Tokyo, JP· patent location history
2017–2018Based in Brookline, MA, US· patent location history
2019Based in Yokohama, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 7 | 2010–2019 |
| FUJITSU LTD | 6 | 2009–2019 |
| FUJI HEAVY IND LTD | 3 | 2016–2017 |
| TAKAHASHI TETSUROself | 3 | 2012–2013 |
| OKAMOTO SEISHI | 2 | 2012 |
Locations
| Location | Patents | Span |
|---|---|---|
| Nirasaki, JP | 7 | 2010–2019 |
| Tokyo, JP | 3 | 2016–2017 |
| Kawasaki, JP | 3 | 2009–2012 |
| Brookline, Massachusetts, US | 2 | 2017–2018 |
| Yokohama, JP | 1 | 2019 |