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Inventor

Molela Moukara

Inventor
München, DE

Overview

11→
Patents
2003–2012
Patent span
Physics
Primary field (CPC G)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
8,293,431'Lithographic mask and method of forming a lithographic mask'20127,354,683'Lithography mask for imaging of convex structures'20087,339,652'Apparatus for projecting a pattern into an image plane'20087,183,022'Method for producing a mask set for lithography including at least one mask and methods for imaging structures of a predetermined layout into a common exposure plane'20077,143,390'Method for creating alternating phase masks'20066,981,241'Method for eliminating phase conflict centers in alternating phase masks, and method for producing alternating phase masks'20056,957,414'Method for determining the ability to project images of integrated semiconductor circuits onto alternating phase masks'20056,730,463'Method for determining and removing phase conflicts on alternating phase masks'20046,680,151'Alternating phase mask'20046,660,437'Alternating phase mask'20036,543,045'Method for detecting and automatically eliminating phase conflicts on alternating phase masks'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2008Patents assigned to INFINEON TECHNOLOGIES AG (9)· patent assignee history
2003–2004Based in Mnchen, DE· patent location history
2005–2008Based in München, DE· patent location history
2006–2012Based in Munich, DE· patent location history
2007Patents assigned to INFINEON TECHNOLGIES AG (1)· patent assignee history
2012Patents assigned to ADVANCED MASK TECHNOLOGY CT GMBH & CO KG (1)· patent assignee history
2012Patents assigned to BYLOOS CARLA (1)· patent assignee history
2012Patents assigned to KOEHLE RODERICK (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
INFINEON TECHNOLOGIES AG92003–2008
ADVANCED MASK TECHNOLOGY CT GMBH & CO KG12012
BYLOOS CARLA12012
INFINEON TECHNOLGIES AG12007
KOEHLE RODERICK12012
Locations
LocationPatentsSpan
München, DE52005–2008
Mnchen, DE42003–2004
Munich, DE22006–2012