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Inventor

Gerrit Streutker

Inventor
Eindhoven, NL

Overview

2→
Patents
2010–2011
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
7,924,406'Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels'20117,671,968'Lithographic apparatus having masking parts and device manufacturing method'2010

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010–2011Patents assigned to ASML NETHERLANDS BV (2)· patent assignee history
2010–2011Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV22010–2011
Locations
LocationPatentsSpan
Eindhoven, NL22010–2011