Inventor
DAVID BESSEMS
Inventor
US
Overview
Patents· 5 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%
H05GX-ray technique23%
F16LPipes15%
H01LSemiconductor devices15%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1015%
PatentTitleYear
12,197,140Substrate table, immersion lithographic apparatus and device manufacturing method202511,963,285Target material control in an EUV light source202411,774,012Apparatus for high pressure connection202311,500,297Anti-rotation coupling202211,215,933Substrate table, immersion lithographic apparatus and device manufacturing method2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2025Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2022–2024Based in US· patent location history
2022–2025Based in NL· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 5 | 2022–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 3 | 2022–2024 |
| NL | 2 | 2022–2025 |