Inventor
Hikaru Momose
Inventor
Kanagawa, JP
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C08Fprimary
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds27%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices22%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
C07DHeterocyclic compounds5%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy5%
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form3%
C08JWorking-up3%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
C08LCompositions of macromolecular compounds3%
PatentTitleYear
11,098,217Coating composition, coating film, and laminated body202111,072,144Laminate202110,513,606(Meth)acrylate resin material, surface hardness enhancer, polycarbonate resin composition, and molded article201910,446,850Binder resin composition for secondary battery electrodes, slurry for secondary battery electrodes, electrode for secondary batteries, and lithium ion secondary battery201910,361,434Binder resin for nonaqueous secondary battery electrode, binder resin composition for nonaqueous secondary battery electrode slurry composition for nonaqueous secondary battery electrode, electrode for nonaqueous secondary battery, and nonaqueous secondary battery20199,774,038'Binder resin for nonaqueous secondary battery electrode, binder resin composition for nonaqueous secondary battery electrode slurry composition for nonaqueous secondary battery electrode, electrode for nonaqueous secondary battery, and nonaqueous secondary battery'20179,733,564'Copolymers for lithography and method for producing same, resist composition, method for producing substrate with pattern formed thereupon, method for evaluating copolymers, and method for analyzing copolymer compositions'20179,188,857'Resist polymer, process for production thereof, resist composition, and process for production of substrates with patterns thereon'20158,614,283'Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer'20138,580,481'Resist polymer and resist composition'20138,476,401'Resist polymer, process for production thereof, resist composition, and process for production of substrated with patterns thereon'20138,241,829'Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer'20128,092,979'Resist polymer and resist composition'20128,049,042'Resist polymer, resist composition, process for pattern formation, and starting compounds for production of the resist polymer'20117,575,846'Resist polymer and resist composition'20097,339,014'(Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern'20087,316,884'5-methylene-1,3-dioxolan-4-one derivatives, process for their production, polymers of the derivatives, resist compositions, and pattern formation process'20087,041,838'(Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns'20066,927,011'Resins for resists and chemically amplifiable resist compositions'2005Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2005–2017Patents assigned to MITSUBISHI RAYON CO (13)· patent assignee history
2006–2013Based in Kanagawa, JP· patent location history
2011–2015Based in Yokohama, JP· patent location history
2012–2017Patents assigned to MOMOSE HIKARU (6)· patent assignee history
2012–2013Patents assigned to UEDA AKIFUMI (5)· patent assignee history
2012–2013Patents assigned to OOTAKE ATSUSHI (4)· patent assignee history
2017–2019Patents assigned to MITSUBISHI CHEM CORP (5)· patent assignee history
2017–2019Based in Otake, JP· patent location history
2021Based in Osaka-shi, JP· patent location history
2021Based in Settsu, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI RAYON CO | 13 | 2005–2017 |
| MOMOSE HIKARUself | 6 | 2012–2017 |
| MITSUBISHI CHEM CORP | 5 | 2017–2019 |
| UEDA AKIFUMI | 5 | 2012–2013 |
| OOTAKE ATSUSHI | 4 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kanagawa, JP | 6 | 2006–2013 |
| Otake, JP | 5 | 2017–2019 |
| Yokohama, JP | 5 | 2011–2015 |
| Osaka-shi, JP | 1 | 2021 |
| Settsu, JP | 1 | 2021 |