Inventor
MARTIJN PETRUS CHRISTIANUS VAN HEUMEN
Inventor
US
Overview
Patents· 9 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H01JElectric discharge tubes or discharge lamps20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
B01DSeparation7%
F16LPipes7%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering3%
PatentTitleYear
12,354,891Particle beam inspection apparatus202512,249,480Fluid transfer system in a charged particle system202512,217,930Systems and methods for thermally conditioning a wafer in a charged particle beam apparatus202511,996,262Fluid transfer system in a charged particle system202411,942,340Particle beam inspection apparatus202411,804,358System and methods for thermally conditioning a wafer in a charged particle beam apparatus202311,764,027Systems and methods of cooling objective lens of a charged-particle beam system202311,430,678Particle beam inspection apparatus202211,139,141Systems and methods for thermally conditioning a wafer in a charged particle beam apparatus2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to ASML NETHERLANDS BV (9)· patent assignee history
2021–2025Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 9 | 2021–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 9 | 2021–2025 |