Inventor
Rueijer Lin
Inventor
Hsinchu, TW
Overview
Patents· 14 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices27%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1027%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1023%
H10DInorganic electric semiconductor devices12%
B81BMicrostructural devices or systems, e.g. micromechanical devices4%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems4%
B08BCleaning in general2%
H01JElectric discharge tubes or discharge lamps2%
PatentTitleYear
10,867,800Method of forming an interconnect structure having a carbon-containing barrier layer202010,840,105Gate structure with insulating structure and method for manufacturing the same202010,714,329Pre-clean for contacts202010,529,575Interconnect structure having a carbon-containing barrier layer202010,505,045Fin field effect transistor (FinFET) device structure with conductive layer between gate and gate contact201910,312,098Method of forming an interconnect structure201910,163,719Method of forming self-alignment contact201810,163,644Interconnect structure including a conductive feature and a barrier layer on sidewalls and a bottom surface of the conductive feature and method of forming the same201810,050,116Semiconductor device structure and method for forming the same20189,991,125Method for forming semiconductor device structure20189,818,834'Semiconductor device structure and method for forming the same'20179,601,430'Semiconductor device structure and method for forming the same'20179,218,970'Stress-controlled formation of TiN hard mask'20158,975,187'Stress-controlled formation of tin hard mask'2015Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2015Patents assigned to TAIWAN SEMICONDUCTOR MFG (2)· patent assignee history
2015–2020Based in Hsinchu, TW· patent location history
2017–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (12)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TAIWAN SEMICONDUCTOR MFG CO LTD | 12 | 2017–2020 |
| TAIWAN SEMICONDUCTOR MFG | 2 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Hsinchu, TW | 14 | 2015–2020 |