Inventor
Niek Jacobus Johannes Roset
Inventor
Eindhoven, NL
Overview
Patents· 17 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1024%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them21%
Y10TTechnical subjects covered by former us classification6%
PatentTitleYear
RE048676Lithographic apparatus, fluid handling structure for use in a lithographic apparatus and device manufacturing method202110,871,714Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus202010,705,426Extraction body for lithographic apparatus202010,578,959Support apparatus, lithographic apparatus and device manufacturing method2020RE047237Lithographic apparatus, fluid handling structure for use in a lithographic apparatus and device manufacturing method20199,971,255Fluid handling structure, a lithographic apparatus and a device manufacturing method20189,927,715'Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus'20189,588,437'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20179,235,138'Fluid handling structure, a lithographic apparatus and a device manufacturing method'20168,941,815'Substrate table for a lithographic apparatus, lithographic apparatus, method of using a substrate table and device manufacturing method'20158,767,169'Lithographic apparatus, fluid handling structure for use in a lithographic apparatus and device manufacturing method'20148,659,742'Lithographic apparatus and a device manufacturing method'20148,441,610'Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods'20137,924,399'Assembly comprising a conditioning system and at least one object, a conditioning system, a lithographic apparatus and methods'20117,728,951'Lithographic apparatus and method for conditioning an interior space of a device manufacturing apparatus'20107,432,513'Gas shower, lithographic apparatus and use of a gas shower'20087,253,875'Lithographic apparatus and device manufacturing method'2007Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2007–2021Patents assigned to ASML NETHERLANDS BV (17)· patent assignee history
2007–2021Based in Eindhoven, NL· patent location history
2008–2010Based in Vlijmen, NL· patent location history
2013–2016Patents assigned to ROSET NIEK JACOBUS JOHANNES (5)· patent assignee history
2014–2016Patents assigned to TEN KATE NICOLAAS (4)· patent assignee history
2014–2015Patents assigned to LAFARRE RAYMOND WILHELMUS LOUIS (3)· patent assignee history
2014–2015Patents assigned to ZDRAVKOV ALEXANDER NIKOLOV (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 17 | 2007–2021 |
| ROSET NIEK JACOBUS JOHANNESself | 5 | 2013–2016 |
| TEN KATE NICOLAAS | 4 | 2014–2016 |
| LAFARRE RAYMOND WILHELMUS LOUIS | 3 | 2014–2015 |
| ZDRAVKOV ALEXANDER NIKOLOV | 2 | 2014–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Eindhoven, NL | 15 | 2007–2021 |
| Vlijmen, NL | 2 | 2008–2010 |