Inventor

Jae-Jong Han

Inventor
Seoul, KR

Overview

25→
Patents
1998–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 25 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices17%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
H10BElectronic memory devices13%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1013%
H01LSemiconductor devices7%
H10NElectric solid-state devices not otherwise provided for5%
C23CCoating metallic material4%
G06FElectric digital data processing4%
H04MTelephonic communication4%
H01JElectric discharge tubes or discharge lamps3%
PatentTitleYear
11,039,493Electronic device for supporting data communication and method therefor202110,983,744Terminal receiving content based on network environment and controlling method thereof202110,957,315Mobile terminal and method for controlling mobile terminal using machine learning202110,931,808Terminal202110,658,249Methods for fabricating finFET devices having gate spacers on field insulating layers20209,859,376'Semiconductor device and method of fabricating the same'20189,390,977'Method for manufacturing a fin=shaped field effect transistor capable of reducing a threshold voltage variation'20169,202,844'Semiconductor devices having blocking layers and methods of forming the same'20158,987,694'Semiconductor devices having a vertical diode and methods of manufacturing the same'20158,497,545'Method of forming nonvolatile memory device having floating gate and related device'20138,241,979'Method of forming a vertical diode and method of manufacturing a semiconductor device using the same'20127,888,204'Method of forming nonvolatile memory device having floating gate and related device'20117,803,679'Method of forming a vertical diode and method of manufacturing a semiconductor device using the same'20107,763,550'Method of forming a layer on a wafer'20107,273,822'Methods and apparatus for forming thin films for semiconductor devices'20077,118,975'Method for manufacturing a semiconductor device'20067,091,074'Method of forming a gate oxide layer in a semiconductor device and method of forming a gate electrode having the same'20066,881,637'Method of forming a gate electrode, method of manufacturing a semiconductor device having the gate electrode, and method of oxidizing a substrate'20056,828,254'Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the same'20046,815,370'Plasma enhanced chemical vapor deposition apparatus and method for forming nitride layer using the same'20046,794,263'Method of manufacturing a semiconductor device including alignment mark'20046,730,570'Method for forming a self-aligned contact of a semiconductor device and method for manufacturing a semiconductor device using the same'20046,723,662'Methods of forming gate oxide films in integrated circuit devices using wet or dry oxidization processes with reduced chloride'20046,225,199'Semiconductor device having triple-well'20015,821,157'Argon amorphizing polysilicon layer fabrication'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2021Patents assigned to SAMSUNG ELECTRONICS CO LTD (22)· patent assignee history
1998–2021Based in Seoul, KR· patent location history
2012–2013Patents assigned to HAN JAE-JONG (2)· patent assignee history
2012–2013Patents assigned to HYUNG YONG-WOO (2)· patent assignee history
2013Patents assigned to JEE JUNG-GEUN (1)· patent assignee history
2021Patents assigned to LG ELECTRONICS INC (3)· patent assignee history
2021Based in Suwon-si, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD221998–2021
LG ELECTRONICS INC32021
HAN JAE-JONGself22012–2013
HYUNG YONG-WOO22012–2013
JEE JUNG-GEUN12013
Locations
LocationPatentsSpan
Seoul, KR241998–2021
Suwon-si, KR12021