Inventor
NITIN K. INGLE
Inventor
US
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Lprimary
H01LSemiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
C23CCoating metallic material11%
H01JElectric discharge tubes or discharge lamps9%
H10DInorganic electric semiconductor devices9%
H10BElectronic memory devices6%
B82YSpecific uses or applications of nanostructures3%
C01BNon-metallic elements3%
PatentTitleYear
12,557,343Method of ultra thinning of wafer202612,495,582Self-aligned wide backside power rail contacts to multiple transistor sources202512,431,360Selective etching between silicon-and-germanium-containing materials with varying germanium concentrations202512,406,832Semiconductor chamber components with advanced dual layer nickel-containing coatings202512,394,631Selective etching of silicon-and-germanium-containing materials with increased surface purities202512,381,086Low temperature graphene growth202512,374,584Multi color stack for self aligned dual pattern formation for multi purpose device structures202512,315,735Methods for removing etch stop layers202512,315,736Methods of highly selective silicon oxide removal202512,203,171Batch curing chamber with gas distribution and individual pumping202511,830,729Low-k boron carbonitride films202311,818,877Three-dimensional dynamic random access memory (DRAM) and methods of forming the same202311,791,155Diffusion barriers for germanium202311,735,467Airgap formation processes202311,732,352Hydrogen free silicon dioxide202311,696,4333D pitch multiplication202311,587,9303-D DRAM structures and methods of manufacture202311,515,163Low temperature graphene growth202211,355,354Thermal deposition of doped silicon oxide202211,211,286Airgap formation processes2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2026Patents assigned to APPLIED MATERIALS INC (20)· patent assignee history
2021–2026Based in US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED MATERIALS INC | 20 | 2021–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| US | 20 | 2021–2026 |