Inventor

James Albert Gilhooly

Inventor

St. Albans, VT, US

Overview

1998–2005

Patent span

Performing operations

Primary field (CPC B)

Patents· 18 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary

B24BMachines, devices, or processes for grinding or polishing40%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%

G01NInvestigating or analysing materials by determining their chemical or physical properties13%

Y10TTechnical subjects covered by former us classification8%

B08BCleaning in general3%

PatentTitleYear

6,899,784'Apparatus for detecting CMP endpoint in acidic slurries'2005 6,878,629'Method for detecting CMP endpoint in acidic slurries'2005 6,506,341'Chemiluminescence detection apparatus'2003 6,440,263'Indirect endpoint detection by chemical reaction and chemiluminescence'2002 6,419,785'Endpoint detection by chemical reaction'2002 6,276,987'Chemical mechanical polishing endpoint process control'2001 6,261,851'Optimization of CMP process by detecting of oxide/nitride interface using IR system'2001 6,254,453'Optimization of chemical mechanical process by detection of oxide/nitride interface using CLD system'2001 6,251,784'Real-time control of chemical-mechanical polishing processing by monitoring ionization current'2001 6,228,280'Endpoint detection by chemical reaction and reagent'2001 6,228,769'Endpoint detection by chemical reaction and photoionization'2001 6,194,230'Endpoint detection by chemical reaction and light scattering'2001 6,180,422'Endpoint detection by chemical reaction'2001 6,176,765'Accumulator for slurry sampling'2001 6,126,848'Indirect endpoint detection by chemical reaction and chemiluminescence'2000 6,066,564'Indirect endpoint detection by chemical reaction'2000 6,021,679'Probe for slurry gas sampling'2000 5,704,987'Process for removing residue from a semiconductor wafer after chemical-mechanical polishing'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2005Patents assigned to IBM (17)· patent assignee history

1998–2005Based in St. Albans, VT, US· patent location history

2003Patents assigned to ECO PHYSICS AG (1)· patent assignee history

2005Patents assigned to ECOPHYSICS AG (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
IBM	17	1998–2005
ECO PHYSICS AG	1	2003
ECOPHYSICS AG	1	2005

Locations

Location	Patents	Span
St. Albans, VT, US	18	1998–2005