Inventor
Yuji Harada
Inventor
Joetsu-shi, JP
Overview
Patents· 113 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices24%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests14%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds13%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds5%
C07CAcyclic or carbocyclic compounds5%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium3%
F02DControlling combustion engines2%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h102%
Y02PClimate change mitigation technologies in the production or processing of goods2%
Y02TClimate change mitigation technologies related to transportation2%
PatentTitleYear
10,934,406Prepreg tape and use thereof202110,920,031Prepreg and fiber-reinforced composite material202110,889,695Tow prepreg, composite material-reinforced pressure vessel, and method of producing composite material-reinforced pressure vessel202110,836,861Methods of preparing and purifying polyalkylene glycol derivative202010,717,804Silicon-containing compound, urethane resin, stretchable film, and method for forming the same202010,696,779Silicon-containing compound, urethane resin, stretchable film, and method for forming the same202010,550,136Method for producing polyalkylene glycol derivative having amino group at end202010,472,377Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator201910,377,775Method for producing polyalkylene glycol derivative having amino group at end201910,311,984Shaft sealing structure and reactor coolant pump201910,273,870Combustion chamber structure of engine201910,119,492Fuel injection control device for direct-injection engine201810,071,418Die casting machine and control method of die casting machine201810,067,161Socket20189,889,500'Die casting machine and control method of die casting machine'20189,874,173Control device for direct injection gasoline engine20189,816,445'Device for controlling direct-injection gasoline engine'20179,708,350'Method for producing polyalkylene glycol derivative having amino group at end, polymerization initiator for use in the same, and alcohol compound as raw material for the polymerization initiator'20179,638,146'Gasoline direct-injection engine'20179,624,820'Control device for direct injection gasoline engines'20179,599,058'Control device of gasoline direct-injection engine'20179,284,408'Method for producing polyalkylene glycol derivative with narrow molecular weight distribution, and acetal group-containing alcohol compound for use therein and alkali metal salt thereof'20169,261,783'Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid'20169,187,404'Method for producing polyalkylene glycol derivative having amino group at end, with narrow molecular weight distribution'20159,086,628'Resist protective film-forming composition and patterning process'20158,945,809'Fluorinated monomer, fluorinated polymer, resist composition, and patterning process'20158,933,251'Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process'20158,916,331'Resist composition and patterning process'20148,697,903'Fluorinated ester monomer, making method, fluorinated ester polymer, and difluorohydroxycarboxylic acid'20148,431,323'Fluorinated monomer of cyclic acetal structure, polymer, resist protective coating composition, resist composition, and patterning process'20138,420,292'Polymer, resist composition, and patterning process'20138,361,703'Resist protective coating composition and patterning process'20138,323,872'Resist protective coating material and patterning process'20128,313,886'Resist composition and patterning process'20128,268,528'Resist composition and patterning process'20128,252,504'Polymer, resist composition, and patterning process'20128,158,330'Resist protective coating composition and patterning process'20128,101,335'Resist composition and patterning process'20128,088,537'Resist top coat composition and patterning process'20128,057,981'Resist composition, resist protective coating composition, and patterning process'20118,043,788'Resist composition and patterning process'20117,851,871'Semiconductor device and method for fabricating the same'20107,771,914'Resist composition and patterning process'20107,771,913'Resist composition and patterning process using the same'20107,759,711'Semiconductor device with substrate having increased resistance due to lattice defect and method for fabricating the same'20107,759,047'Resist protective film composition and patterning process'20107,670,750'Polymer, resist protective coating material, and patterning process'20107,666,572'Resist top coat composition and patterning process'20107,666,967'Ester compound, polymer, resist composition, and patterning process'20107,642,034'Polymer, resist protective coating material, and patterning process'20107,622,242'Resist composition and patterning process'20097,598,016'Resist composition and patterning process'20097,592,407'Polymerizable fluorinated compound, making method, polymer, resist composition and patterning process'20097,569,323'Resist protective coating material and patterning process'20097,537,880'Polymer, resist composition, and patterning process'20097,514,204'Resist composition and patterning process'20097,488,567'Polymer, resist composition and patterning process'20097,474,548'Semiconductor memory device and method for manufacturing the same'20097,455,952'Patterning process and resist overcoat material'20087,378,218'Polymer, resist composition and patterning process'20087,332,616'Polymerizable compound, polymer, positive-resist composition, and patterning process using the same'20087,276,623'Polymerizable ester compounds'20077,241,553'Polymer, resist composition, and patterning process'20077,232,641'Polymerizable compound, polymer, positive-resist composition, and patterning process using the same'20077,189,493'Polymer, positive resist composition, and patterning process using the same'20077,169,869'Polymers, resist compositions and patterning process'20077,125,643'Polymers, resist compositions and patterning process'20067,125,641'Polymers, resist compositions and patterning process'20067,125,642'Sulfonates, polymers, resist compositions and patterning process'20067,078,147'Polymers, resist compositions and patterning process'20067,067,231'Polymers, resist compositions and patterning process'20067,012,161'Compound, fluorine-containing polymerizable cyclic olefin compound'20067,005,228'Polymers, resist compositions and patterning process'20067,001,707'Resist compositions and patterning process'20066,946,235'Polymers, resist compositions and patterning process'20056,933,095'Polymers, resist compositions and patterning process'20056,916,592'Esters, polymers, resist compositions and patterning process'20056,878,501'Polymer, chemically amplified resist composition and patterning process'20056,875,556'Resist compositions and patterning process'20056,872,514'Polymers, resist compositions and patterning process'20056,866,983'Resist compositions and patterning process'20056,864,037'Polymers, resist compositions and patterning process'20056,861,197'Polymers, resist compositions and patterning process'20056,855,477'Chemically amplified resist compositions and patterning process'20056,835,524'Polymers, chemical amplification resist compositions and patterning process'20046,824,955'Polymers, resist compositions and patterning process'20046,790,591'Polymers, resist compositions and patterning process'20046,790,586'Resist compositions and patterning process'20046,730,451'Polymers, chemical amplification resist compositions and patterning process'20046,710,148'Polymers, resist compositions and patterning process'20046,680,389'Ester compounds'20046,660,447'Polymers, resist compositions and patterning process'20036,603,037'Ester compounds'20036,582,880'Polymers, resist compositions and patterning process'20036,579,658'Polymers, resist compositions and patterning process'20036,511,787'Polymers, resist compositions and patterning process'20036,461,790'Polymers, chemical amplification resist compositions and patterning process'20026,461,789'Polymers, chemical amplification resist compositions and patterning process'20026,461,791'Polymers, chemical amplification resist compositions and patterning process'20026,436,606'Polymers, resist compositions and patterning process'20026,369,279'Styrene derivatives'20026,333,436'Styrene derivatives'20015,341,867'Electromagnetic levitation type continuous metal casting apparatus'19945,244,034'Electromagnetic levitation type continuous metal casting'19934,631,820'Mounting assembly and mounting method for an electronic component'1986D0287507'Desk-top electronic calculator'19864,608,465'Keyboard'1986D0282854'Desk-top electronic calculator'19864,553,820'Keyboard switch with a mesh of fibers'19854,508,428'Ink projections on the polarizer of an electro-optic display'19854,180,711'Desk-top calculator keyboard switch'19794,042,090'Key top'19773,950,627'Push button switch'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–2021Based in Tokyo, JP· patent location history
2001–2020Patents assigned to SHINETSU CHEMICAL CO (71)· patent assignee history
2001–2006Based in Nishikamo-gun, JP· patent location history
2003–2010Patents assigned to CENTRAL GLASS CO LTD (28)· patent assignee history
2003–2008Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (14)· patent assignee history
2003–2012Based in Niigata, JP· patent location history
2007–2020Based in Joetsu-shi, JP· patent location history
2011–2015Patents assigned to HARADA YUJI (15)· patent assignee history
2012–2015Patents assigned to HASEGAWA KOJI (11)· patent assignee history
2017–2019Based in Higashihiroshima, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 71 | 2001–2020 |
| CENTRAL GLASS CO LTD | 28 | 2003–2010 |
| HARADA YUJIself | 15 | 2011–2015 |
| MATSUSHITA ELECTRIC INDUSTRIAL CO LTD | 14 | 2003–2008 |
| HASEGAWA KOJI | 11 | 2012–2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Joetsu-shi, JP | 41 | 2007–2020 |
| Niigata, JP | 28 | 2003–2012 |
| Nishikamo-gun, JP | 13 | 2001–2006 |
| Tokyo, JP | 12 | 1976–2021 |
| Higashihiroshima, JP | 7 | 2017–2019 |