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Inventor

Wilhelmus Jacobus Maria Rooijakkers

Inventor
Waalre, NL

Overview

5→
Patents
2012–2019
Patent span
Physics
Primary field (CPC G)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices56%
H01JElectric discharge tubes or discharge lamps22%
G01MTesting static or dynamic balance of machines or structures11%
G06FElectric digital data processing11%
PatentTitleYear
10,401,734Lithographic method and apparatus20199,170,498'Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensor'20158,760,625'Lithographic apparatus, aberration detector and device manufacturing method'20148,269,186'Radiation detector'20128,124,939'Radiation detector'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012–2019Patents assigned to ASML NETHERLANDS BV (5)· patent assignee history
2012–2014Patents assigned to ROOIJAKKERS WILHELMUS JACOBUS MARIA (3)· patent assignee history
2012Patents assigned to WEHRENS MARTIJN GERARD DOMINIQUE (2)· patent assignee history
2012–2019Based in Waalre, NL· patent location history
2015Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV52012–2019
ROOIJAKKERS WILHELMUS JACOBUS MARIAself32012–2014
WEHRENS MARTIJN GERARD DOMINIQUE22012
Locations
LocationPatentsSpan
Waalre, NL42012–2019
Eindhoven, NL12015