Inventor

MARKUS GERARDUS MARTINUS MARIA VAN KRAAIJ

Inventor
NL

Overview

10→
Patents
2021–2025
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
G06TImage data processing or generation, in general10%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein7%
G06FElectric digital data processing7%
G06NComputing arrangements based on specific computational models7%
G21KHandling of particles or ionising radiation not otherwise provided for7%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
G06VImage or video recognition or understanding3%
H01LSemiconductor devices3%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2021–2025Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2021–2025Based in NL· patent location history
2024Patents assigned to ASML HOLDING NV (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV102021–2025
ASML HOLDING NV12024
Locations
LocationPatentsSpan
NL102021–2025