Inventor

Motoaki Iwabuchi

Inventor

Jyoetsu, JP

Overview

1992–2020

Patent span

Chemistry

Primary field (CPC C)

Patents· 47 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C08Gprimary

C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds13%

C09DCoating compositions, e.g. paints, varnishes or lacquers11%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%

C08LCompositions of macromolecular compounds9%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients5%

H01BCables5%

A61BDiagnosis5%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds5%

B01DSeparation4%

PatentTitleYear

10,864,366Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode2020 10,844,257Adhesive composition, bio-electrode, and method for manufacturing a bio-electrode2020 10,808,148Adhesive composition, bio-electrode, method for manufacturing a bio-electrode, and salt2020 10,800,916Stretchable film composition, stretchable film, and method for forming the same2020 10,792,489Bio-electrode composition, bio-electrode, and method for manufacturing the bio-electrode2020 10,759,938Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode2020 10,743,788Bio-electrode composition, bio-electrode, and method for manufacturing a bio-electrode2020 10,734,132Bio-electrode composition, bio-electrode, method for manufacturing the bio-electrode, and polymer compound2020 10,726,967Polymerizable monomer, polymer compound, biological electrode composition, biological electrode, and method for producing biological electrode2020 10,695,554Bio-electrode composition, bio-electrode, method for manufacturing the bio-electrode, and polymer2020 10,610,906Method for manufacturing a resist composition2020 10,610,116Adhesive composition, bio-electrode, and method for manufacturing a bio-electrode2020 10,603,696Process for manufacturing resist composition and patterning process2020 10,591,817Method for producing composition for forming coating film for lithography and patterning process2020 10,584,221Stretchable film, method for forming the same, stretchable wiring film, and method for manufacturing the same2020 10,544,272Stretchable film and method for forming the same, method for manufacturing coated wiring substrate, and stretchable wiring film and method for manufacturing the same2020 10,501,585Stretchable film and method for forming the stretchable film2019 10,047,244Method for producing a composition for forming an organic film2018 9,207,535'Method for producing resist composition'2015 9,201,301'Method for producing resist composition'2015 9,091,925'Method for forming silicon-containing resist underlayer film'2015 8,927,192'Production method of resist composition for lithography'2015 8,822,128'Production method of resist composition for lithography'2014 8,329,376'Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method'2012 7,910,283'Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method'2011 7,855,043'Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method'2010 7,678,529'Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method'2010 7,585,613'Antireflection film composition, substrate, and patterning process'2009 7,541,134'Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same'2009 7,485,690'Sacrificial film-forming composition, patterning process, sacrificial film and removal method'2009 7,417,104'Porous film-forming composition, patterning process, and porous sacrificial film'2008 7,402,621'Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device'2008 7,385,021'Sacrificial film-forming composition, patterning process, sacrificial film and removal method'2008 7,357,961'Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device'2008 7,332,446'Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device'2008 7,303,785'Antireflective film material, and antireflective film and pattern formation method using the same'2007 7,202,013'Antireflective film material, and antireflective film and pattern formation method using the same'2007 7,163,778'Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern'2007 7,132,473'Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device'2006 7,126,208'Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device'2006 6,680,107'Film forming composition, porous film and their preparation'2004 6,211,307'Organopolysiloxane composition for forming fired film'2001 5,466,847'Process for preparing hexamethylcyclotrisilazane'1995 5,194,627'N-tert-butyldialkylsilylmaleimide and its manufacture'1993 5,136,072'Thexyl C.sub.1 -C.sub.4 alkyl dialkoxy silane'1992 5,136,073'Thexyl trialkoxy silane'1992 5,084,591'Method for the preparation of cyclopentyl trichlorosilane'1992

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1992–2020Patents assigned to SHINETSU CHEMICAL CO (44)· patent assignee history

1992–1993Based in Annaka, JP· patent location history

1992–2004Based in Gunma, JP· patent location history

2006–2008Patents assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (4)· patent assignee history

2006–2009Based in Niigata, JP· patent location history

2008–2020Based in Joetsu-shi, JP· patent location history

2009Patents assigned to IBM (2)· patent assignee history

2012–2015Patents assigned to IWABUCHI MOTOAKI (3)· patent assignee history

2012–2015Patents assigned to OGIHARA TSUTOMU (3)· patent assignee history

2014–2020Based in Jyoetsu, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SHINETSU CHEMICAL CO	44	1992–2020
MATSUSHITA ELECTRIC INDUSTRIAL CO LTD	4	2006–2008
IWABUCHI MOTOAKIself	3	2012–2015
OGIHARA TSUTOMU	3	2012–2015
IBM	2	2009

Locations

Location	Patents	Span
Jyoetsu, JP	16	2014–2020
Joetsu-shi, JP	15	2008–2020
Niigata, JP	9	2006–2009
Annaka, JP	3	1992–1993
Gunma, JP	2	1992–2004