Inventor
Fan-Wei Lin
Inventor
Kaohsiung, TW
Overview
Patents· 1 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions20%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1020%
PatentTitleYear
10,566,290Alignment mark and measurement method thereof2020Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2020Patents assigned to UNITED MICROELECTRONICS CORP (1)· patent assignee history
2020Based in Kaohsiung, TW· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| UNITED MICROELECTRONICS CORP | 1 | 2020 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kaohsiung, TW | 1 | 2020 |