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Inventor

Chul-Jin Hwang

Inventor
Seongnam-si, KR

Overview

5→
Patents
2011–2018
Patent span
Electricity
Primary field (CPC H)

Patents· 5 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Bprimary
H10BElectronic memory devices27%
G11CStatic stores20%
H01LSemiconductor devices20%
H10DInorganic electric semiconductor devices13%
A61CDentistry7%
B22FWorking metallic powder7%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%
PatentTitleYear
10,026,747Non-volatile memory device with first gate structure in memory cell region and second gate structure in peripheral circuit region and non-volatile memory system including the same20189,691,782'Non-volatile memory device'20179,589,643'Nonvolatile memory device including multi-plane'20179,424,928'Nonvolatile memory device including multi-plane'20167,875,237'Method for manufacturing dental scaler tip using powder injection molding process, mold used therein and scaler tip manufactured by the same'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011Patents assigned to KOREA IND TECH INST (1)· patent assignee history
2011Based in Bucheon-si, KR· patent location history
2016–2018Patents assigned to SAMSUNG ELECTRONICS CO LTD (4)· patent assignee history
2016–2018Based in Seongnam-si, KR· patent location history
2017Patents assigned to HWANG CHUL-JIN (1)· patent assignee history
2017Patents assigned to LIM BONG-SOON (1)· patent assignee history
2017Patents assigned to PARK KI-TAE (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
SAMSUNG ELECTRONICS CO LTD42016–2018
HWANG CHUL-JINself12017
KOREA IND TECH INST12011
LIM BONG-SOON12017
PARK KI-TAE12017
Locations
LocationPatentsSpan
Seongnam-si, KR42016–2018
Bucheon-si, KR12011