LexDanaLexDanabeta
Inventor

Tetsuji Togawa

Inventor
Tokyo, JP

Overview

136→
Patents
1997–2019
Patent span
Performing operations
Primary field (CPC B)

Patents· 136 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B24Bprimary
B24BMachines, devices, or processes for grinding or polishing46%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1034%
B08BCleaning in general5%
H01LSemiconductor devices2%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests2%
F24FAir-conditioning2%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h102%
B24DTools for grinding, buffing or sharpening1%
C23CCoating metallic material1%
C25DProcesses for the electrolytic or electrophoretic production of coatings1%
PatentTitleYear
10,493,588Polishing apparatus and polishing method201910,343,252Polishing apparatus for detecting abnormality in polishing of a substrate201910,307,882Method and apparatus for polishing a substrate201910,293,455Polishing apparatus201910,155,294Polishing apparatus and polishing method201810,040,166Polishing apparatus20189,914,196'Polishing apparatus and polishing method'20189,808,836'Substrate processing apparatus'20179,808,903'Method of polishing back surface of substrate and substrate processing apparatus'20179,782,869'Apparatus for detecting abnormality in polishing of a substrate'20179,724,797'Polishing apparatus'20179,694,467'Polishing method of polishing a substrate'20179,630,289'Polishing method involving a polishing member polishing at angle tangent to the substrate rotational direction'20179,604,335'Wafer polishing apparatus'20179,566,616'Substrate processing apparatus'20179,561,573'Polishing apparatus'20179,457,448'Polishing apparatus and polishing method'20169,457,447'Polishing apparatus and polishing method'20169,399,274'Wafer polishing method'20169,308,621'Method and apparatus for polishing a substrate'20169,248,545'Substrate processing apparatus and substrate processing method'20169,248,543'Method of detecting abnormality in polishing of a substrate and polishing apparatus'20168,979,615'Polishing apparatus and polishing method'20158,870,625'Method and apparatus for dressing polishing pad, profile measuring method, substrate polishing apparatus, and substrate polishing method'20148,845,396'Polishing apparatus'20148,748,289'Method for manufacturing semiconductor device'20148,641,480'Polishing apparatus and polishing method'20148,485,866'Substrate holding apparatus, polishing apparatus, and polishing method'20138,445,360'Method for manufacturing semiconductor device'20138,430,716'Polishing method and polishing apparatus'20138,357,029'Polishing apparatus'20138,292,694'Substrate holding mechanism, substrate polishing apparatus and substrate polishing method'20128,267,746'Substrate holding apparatus, polishing apparatus, and polishing method'20128,152,594'Polishing apparatus'20128,100,739'Substrate holding apparatus, polishing apparatus, and polishing method'20128,100,743'Polishing apparatus'20128,083,571'Polishing apparatus'20118,070,560'Polishing apparatus and method'20117,988,537'Substrate holding apparatus and polishing apparatus'20117,967,665'Substrate holding apparatus, polishing apparatus, and polishing method'2011D0634719'Elastic membrane for semiconductor wafer polishing apparatus'20117,883,394'Substrate holding mechanism, substrate polishing apparatus and substrate polishing method'20117,867,063'Substrate holding apparatus and polishing apparatus'20117,854,646'Substrate polishing apparatus and substrate polishing method'20107,850,509'Substrate holding apparatus'20107,850,817'Polishing device and substrate processing device'20107,708,618'Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device'20107,670,206'Substrate polishing apparatus and substrate polishing method'20107,635,292'Substrate holding device and polishing apparatus'20097,632,378'Polishing apparatus'20097,632,173'Substrate holding apparatus and polishing apparatus'20097,491,117'Substrate holding apparatus'20097,465,214'Substrate holding apparatus and polishing apparatus'20087,458,879'Dressing apparatus and substrate holding apparatus'20087,448,940'Polishing apparatus and polishing method'20087,419,420'Substrate holding mechanism, substrate polishing apparatus and substrate polishing method'20087,361,076'Method for estimating polishing profile or polishing amount, polishing method and polishing apparatus'20087,357,699'Substrate holding apparatus and polishing apparatus'20087,311,585'Substrate holding apparatus and polishing apparatus'20077,234,999'Method for estimating polishing profile or polishing amount, polishing method and polishing apparatus'20077,223,690'Substrate processing method'20077,217,175'Polishing apparatus and polishing method'20077,207,862'Polishing apparatus and method for detecting foreign matter on polishing surface'20077,198,552'Polishing apparatus'20077,163,895'Polishing method'20077,156,725'Substrate polishing machine'20077,150,673'Method for estimating polishing profile or polishing amount, polishing method and polishing apparatus'20067,108,592'Substrate holding apparatus and polishing apparatus'20067,108,581'Polishing apparatus'20067,083,507'Substrate holding apparatus'20067,048,609'Pressure control system and polishing apparatus'20067,033,260'Substrate holding device and polishing device'20066,997,782'Polishing apparatus and a method of polishing and cleaning and drying a wafer'20066,957,998'Polishing apparatus'20056,953,390'Polishing apparatus'20056,942,541'Polishing apparatus'20056,926,585'Pressure control system and polishing apparatus'20056,899,604'Dressing apparatus and polishing apparatus'20056,878,044'Polishing apparatus'20056,852,019'Substrate holding apparatus'20056,828,225'Substrate processing method'20046,790,763'Substrate processing method'20046,783,440'Polishing apparatus'20046,682,408'Polishing apparatus'20046,609,962'Dressing apparatus and polishing apparatus'20036,607,427'Dressing apparatus and polishing apparatus'2003RE038215'Polishing apparatus'20036,602,119'Dressing apparatus'20036,579,148'Polishing apparatus'20036,578,891'Substrate holder and substrate transfer apparatus using the same'20036,558,226'Polishing apparatus'20036,500,051'Polishing apparatus and method'20026,458,012'Polishing apparatus'20026,447,385'Polishing apparatus'20026,428,400'Drainage structure in polishing plant'20026,413,357'Polishing apparatus'20026,413,154'Polishing apparatus'20026,409,582'Polishing apparatus'20026,398,626'Polishing apparatus'20026,390,901'Polishing apparatus'20026,379,229'Polishing apparatus'20026,358,126'Polishing apparatus'20026,358,131'Polishing apparatus'20026,358,128'Polishing apparatus'20026,354,918'Apparatus and method for polishing workpiece'20026,354,922'Polishing apparatus'20026,338,669'Polishing device'20026,328,629'Method and apparatus for polishing workpiece'20016,319,105'Polishing apparatus'20016,312,312'Polishing apparatus'20016,283,822'Polishing apparatus'20016,241,578'Carrier device in polishing apparatus and method for controlling carrier device'20016,241,592'Polishing apparatus'20016,227,954'Polishing apparatus'20016,139,677'Polishing apparatus'20006,116,986'Drainage structure in polishing plant and method of polishing using structure'20006,110,024'Polishing apparatus'20006,074,276'Polishing apparatus'20006,050,884'Polishing apparatus'20006,042,455'Polishing apparatus'20005,961,380'Robotic transport apparatus'19995,944,941'Turning-over machine and polishing apparatus'19995,934,984'Polishing apparatus'19995,931,723'Polishing apparatus'19995,893,794'Polishing apparatus having robotic transport apparatus'19995,885,134'Polishing apparatus'19995,860,847'Polishing apparatus'19995,839,947'Polishing apparatus'19985,830,045'Polishing apparatus'19985,827,110'Polishing facility'19985,679,059'Polishing aparatus and method'19975,679,064'Polishing apparatus including detachable cloth cartridge'19975,670,011'Apparatus and method for polishing workpiece'19975,647,792'Polishing apparatus'19975,645,473'Polishing apparatus'19975,643,067'Dressing apparatus and method'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2019Patents assigned to EBARA CORP (134)· patent assignee history
1997–2014Patents assigned to TOSHIBA KK (15)· patent assignee history
1997–2007Based in Fujisawa, JP· patent location history
1998–2012Based in Chigasaki, JP· patent location history
1999–2008Based in Kanagawa, JP· patent location history
2002–2019Based in Tokyo, JP· patent location history
2011–2016Patents assigned to TOGAWA TETSUJI (17)· patent assignee history
2011–2016Patents assigned to FUKUSHIMA MAKOTO (10)· patent assignee history
2011–2014Patents assigned to NABEYA OSAMU (9)· patent assignee history
2011Based in Saitama-shi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
EBARA CORP1341997–2019
TOGAWA TETSUJIself172011–2016
TOSHIBA KK151997–2014
FUKUSHIMA MAKOTO102011–2016
NABEYA OSAMU92011–2014
Locations
LocationPatentsSpan
Tokyo, JP702002–2019
Chigasaki, JP421998–2012
Kanagawa, JP131999–2008
Fujisawa, JP101997–2007
Saitama-shi, JP12011