Inventor
Xinjian Lei
Inventor
Vista, CA, US
Overview
Patents· 89 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C23Cprimary
C23CCoating metallic material25%
C07FAcyclic, carbocyclic or heterocyclic compounds containing elements other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur, selenium or tellurium19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
H01LSemiconductor devices11%
C09DCoating compositions, e.g. paints, varnishes or lacquers6%
C01BNon-metallic elements4%
H10DInorganic electric semiconductor devices3%
C01PIndexing scheme relating to structural and physical aspects of solid inorganic compounds2%
Y10TTechnical subjects covered by former us classification2%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds1%
PatentTitleYear
D0916180POS machine2021D0912725POS machine202110,822,458Organoamino-functionalized linear and cyclic oligosiloxanes for deposition of silicon-containing films202010,763,103Boron-containing compounds, compositions, and methods for the deposition of a boron containing films202010,745,808Methods for depositing Group 13 metal or metalloid nitride films202010,703,915Compositions and methods for the deposition of silicon oxide films202010,464,953Carbon bridged aminosilane compounds for high growth rate silicon-containing films201910,468,244Precursors and flowable CVD methods for making low-K films to fill surface features201910,460,929Organoaminosilane precursors and methods for depositing films comprising same201910,453,675Organoaminosilane precursors and methods for depositing films comprising same201910,421,766Bisaminoalkoxysilane compounds and methods for using same to deposit silicon-containing films201910,422,034Silicon-based films and methods of forming the same201910,395,920Alkyl-alkoxysilacyclic compounds201910,354,860Method and precursors for manufacturing 3D devices201910,319,862Barrier materials for display devices201910,316,407Compositions and methods using same for deposition of silicon-containing films201910,319,584Compositions and processes for depositing carbon-doped silicon-containing films201910,294,250Organoaminosilanes and methods for making same201910,279,959Alkoxysilylamine compounds and applications thereof201910,283,350Methods for depositing films with organoaminodisilane precursors201910,283,348High temperature atomic layer deposition of silicon-containing films201910,242,864High temperature atomic layer deposition of silicon oxide thin films201910,145,008Compositions and methods using same for carbon doped silicon containing films201810,106,890Compositions and methods using same for deposition of silicon-containing film201810,077,364Organoaminodisilane precursors and methods for depositing films comprising same20189,994,954Volatile dihydropyrazinly and dihydropyrazine metal complexes20189,997,350Methods for depositing films with organoaminodisilane precursors20189,978,585Organoaminodisilane precursors and methods for depositing films comprising same20189,922,818'Alkyl-alkoxysilacyclic compounds'20189,905,415'Methods for depositing silicon nitride films'20189,879,340'Silicon-based films and methods of forming the same'20189,809,711'Catalyst and formulations comprising same for alkoxysilanes hydrolysis reaction in semiconductor process'20179,796,739'AZA-polysilane precursors and methods for depositing films comprising same'20179,758,534'Organoaminosilanes and methods for making same'20179,677,178'Alkoxyaminosilane compounds and applications thereof'20179,627,193'Organoaminodisilane precursors and methods for depositing films comprising same'20179,613,799'Methods for depositing films with organoaminodisilane precursors'20179,598,766'Vessel with filter'20179,543,517'Method of making a multicomponent film'20179,502,234'Methods to prepare silicon-containing films'20169,460,912'High temperature atomic layer deposition of silicon oxide thin films'20169,447,287'Compositions and processes for depositing carbon-doped silicon-containing films'20169,435,027'Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel'20169,337,018'Methods for depositing films with organoaminodisilane precursors'20169,243,324'Methods of forming non-oxygen containing silicon-based films'20169,233,990'Organoaminosilanes and methods for making same'20169,214,630'Method of making a multicomponent film'20159,200,167'Alkoxyaminosilane compounds and applications thereof'20159,079,923'Multidentate ketoimine ligands for metal complexes'20159,018,387'Complexes of imidazole ligands'20159,005,719'Organoaminosilane precursors and methods for making and using same'20158,993,072'Halogenated organoaminosilane precursors and methods for depositing films comprising same'20158,962,875'Metal-enolate precursors for depositing metal-containing films'20158,952,188'Group 4 metal precursors for metal-containing films'20158,940,648'Process for producing silicon and oxide films from organoaminosilane precursors'20158,912,353'Organoaminosilane precursors and methods for depositing films comprising same'20148,906,455'Low temperature deposition of silicon-containing films'20148,828,505'Plasma enhanced cyclic chemical vapor deposition of silicon-containing films'20148,771,807'Organoaminosilane precursors and methods for making and using same'20148,722,933'Method for preparing metal complexes of polydentate beta-ketoiminates'20148,708,320'Splashguard and inlet diffuser for high vacuum, high flow bubbler vessel'20148,691,710'Group IV metal complexes for metal-containing film deposition'20148,680,289'Complexes of imidazole ligands'20148,642,797'Amidate precursors for depositing metal containing films'20148,617,305'Metal complexes for metal-containing film deposition'20138,592,058'Methods of forming strontium titanate films'20138,592,606'Liquid precursor for depositing group 4 metal containing films'20138,563,353'Method of making a multicomponent film'20138,530,361'Process for producing silicon and oxide films from organoaminosilane precursors'20138,507,040'Binary and ternary metal chalcogenide materials and method of making and using same'20138,507,704'Liquid composition containing aminoether for deposition of metal-containing films'20138,471,049'Precursors for depositing group 4 metal-containing films'20138,313,807'High coordination sphere group 2 metal β-diketiminate precursors'20128,298,628'Low temperature deposition of silicon-containing films'20128,247,617'Group 2 metal precursors for depositing multi-component metal oxide films'20128,202,808'Methods of forming strontium titanate films'20128,193,027'Method of making a multicomponent film'20128,092,870'Preparation of metal oxide thin film via cyclic CVD or ALD'20127,947,814'Metal complexes of polydentate beta-ketoiminates'20117,919,409'Materials for adhesion enhancement of copper film on diffusion barriers'20117,875,312'Process for producing silicon oxide films for organoaminosilane precursors'20117,754,906'Ti, Ta, Hf, Zr and related metal silicon amides for ALD/CVD of metal-silicon nitrides, oxides or oxynitrides'20107,723,493'Metal complexes of tridentate BETA -ketoiminates'20107,691,984'Metal complexes of tridentate β-ketoiminates'20107,678,422'Cyclic chemical vapor deposition of metal-silicon containing films'20107,442,822'Stabilization of nitrogen-containing and oxygen-containing organosilanes using weakly basic ion-exchange resins'20087,064,224'Organometallic complexes and their use as precursors to deposit metal films'20067,064,227'Precursors for silica or metal silicate films'20066,552,209'Preparation of metal imino/amino complexes for metal oxide and metal nitride thin films'2003Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2003–2020Patents assigned to AIR PROD & CHEM (68)· patent assignee history
2003–2020Based in Vista, CA, US· patent location history
2012–2016Patents assigned to LEI XINJIAN (29)· patent assignee history
2012–2015Patents assigned to SPENCE DANIEL P (12)· patent assignee history
2012–2016Patents assigned to XIAO MANCHAO (11)· patent assignee history
2017–2020Patents assigned to VERSUM MAT US LLC (34)· patent assignee history
2021Based in Guangdong, CN· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AIR PROD & CHEM | 68 | 2003–2020 |
| VERSUM MAT US LLC | 34 | 2017–2020 |
| LEI XINJIANself | 29 | 2012–2016 |
| SPENCE DANIEL P | 12 | 2012–2015 |
| XIAO MANCHAO | 11 | 2012–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Vista, California, US | 87 | 2003–2020 |
| Guangdong, CN | 2 | 2021 |