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Inventor

Shuitsu Fujii

Inventor
Hiroshima, JP

Overview

6→
Patents
1999–2016
Patent span
Electricity
Primary field (CPC H)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H05Hprimary
H05HPlasma technique36%
H01JElectric discharge tubes or discharge lamps18%
A61LMethods or apparatus for sterilising materials or objects in general9%
C01BNon-metallic elements9%
C23CCoating metallic material9%
H01PWaveguides9%
H03HImpedance networks, e.g. resonant circuits9%
PatentTitleYear
9,526,160'Cavity resonator of microwave plasma generating apparatus'20167,858,899'Coaxial microwave plasma torch'20107,683,342'Plasma source'20107,514,377'Plasma generator, ozone generator, substrate processing apparatus and manufacturing method of semiconductor device'20096,080,271'Plasma source for generating inductively coupled, plate-shaped plasma, having magnetically permeable core'20005,936,481'System for impedance matching and power control for apparatus for high frequency plasma treatment'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2000Patents assigned to ADTEC CORP LIMITED (2)· patent assignee history
1999–2010Based in Fukuyama, JP· patent location history
2009–2010Patents assigned to ADTEC PLASMA TECHNOLOGY CO LTD (2)· patent assignee history
2009Patents assigned to HITACHI INT ELECTRIC INC (1)· patent assignee history
2009–2016Based in Hiroshima, JP· patent location history
2010Patents assigned to ADTEC EUROP LTD (1)· patent assignee history
2016Patents assigned to ADTEC PLASMA TECH CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ADTEC CORP LIMITED21999–2000
ADTEC PLASMA TECHNOLOGY CO LTD22009–2010
ADTEC EUROP LTD12010
ADTEC PLASMA TECH CO LTD12016
HITACHI INT ELECTRIC INC12009
Locations
LocationPatentsSpan
Hiroshima, JP32009–2016
Fukuyama, JP31999–2010