Inventor
YASUNORI YONEKUTA
Inventor
JP
Overview
Patents· 11 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices16%
C07CAcyclic or carbocyclic compounds13%
C07DHeterocyclic compounds13%
H10KOrganic electric solid-state devices13%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds11%
C09DCoating compositions, e.g. paints, varnishes or lacquers8%
C09KMaterials for miscellaneous applications, not provided for elsewhere8%
H05BElectric heating8%
C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients3%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments3%
PatentTitleYear
12,510,824Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device202512,479,859Photoelectric conversion element, imaging element, optical sensor, and compound202512,404,264Organic electric light emitting element, material for said element, and light emitting device, display device, and illumination device employing said element202512,265,329Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic device202512,164,230Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and compound202411,844,229Electroluminescent element, and light emitting device, display device and lighting device each using organic electroluminescent element202311,835,849Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device202311,744,144Organic electroluminescent element, light-emitting material therefor, light emitting device, display device, and illumination device202311,687,001Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device202311,563,178Organic electroluminescent element, compound for use in the element, and light emitting device, display device, and illumination device using the element202311,150,557Pattern forming method, method for manufacturing electronic device, monomer for producing resin for semiconductor device manufacturing process, resin, method for producing resin, actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film2021Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2021–2025Patents assigned to FUJIFILM CORP (7)· patent assignee history
2021–2025Based in JP· patent location history
2023–2025Patents assigned to UDC IRELAND LTD (4)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJIFILM CORP | 7 | 2021–2025 |
| UDC IRELAND LTD | 4 | 2023–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 11 | 2021–2025 |