Inventor
SEIICHIRO TACHIBANA
Inventor
JP
Overview
Patents· 15 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices18%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds13%
C08LCompositions of macromolecular compounds11%
H01LSemiconductor devices8%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds7%
C09DCoating compositions, e.g. paints, varnishes or lacquers7%
C07CAcyclic or carbocyclic compounds5%
C07DHeterocyclic compounds5%
C08JWorking-up4%
PatentTitleYear
12,588,474Composition for forming protective film against alkaline aqueous hydrogen peroxide, substrate for producing semiconductor apparatus, method for forming protective film, and method for forming pattern202612,379,663Material for forming organic film, patterning process, and polymer202512,379,662Material for forming organic film, patterning process, compound, and polymer202512,032,287Resist material and patterning process202411,994,798Resist material and patterning process202411,886,118Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film202411,851,530Material for forming organic film, patterning process, and polymer202311,692,066Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film202311,676,814Material for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process202311,635,691Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and polymer202311,614,686Resist composition and patterning process202311,500,292Material for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, patterning process, and compound for forming organic film202211,485,824Thermosetting silicon-containing compound, composition for forming a silicon-containing film, and patterning process202211,307,497Compound, composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process202211,267,937Method for producing dihydroxynaphthalene condensate and dihydroxynaphthalene condensate2022Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2022–2026Patents assigned to SHINETSU CHEMICAL CO (15)· patent assignee history
2022–2026Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| SHINETSU CHEMICAL CO | 15 | 2022–2026 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 15 | 2022–2026 |